Electronic semiconducting device and method for preparing the electronic semiconducting device
申请人:Novaled GmbH
公开号:US11239440B2
公开(公告)日:2022-02-01
The present invention relates to an electronic device comprising between a first electrode and a second electrode at least one first hole transport layer, wherein the first hole transport layer comprises (i) at least one first hole transport matrix compound consisting of covalently bound atoms and (ii) at least one electrical p-dopant selected from metal sate and from electrically neutral metal complexes comprising a metal cation and a at least one anion and/or at least one anionic ligand consisting of at least 4 covalently bound atoms, wherein the metal cation of the electrical p-dopant is selected from alkali metals; alkaline earth metals, Pb, Me, Fe, Co, Ni, Zn, Cd; rare earth metals in oxidation state (II) or (III); Al, Ga, In; and from Sn, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W in oxidation state (TV) or less; provided that a) p-dopants comprising anion or anionic ligand having generic formula (Ia) or (Ib) wherein A1, A2, A3 and A4 are independently selected from CO, SO2 or POR1; R1=electron withdrawing group selected from the group comprising halide, nitrile, halogenated or perhalogenated C1 to C20 alkyl, halogenated or perhalogenated C6 to C20 aryl, or halogenated or perhalogenated heteroaryl with 5 to 20 ring-forming atoms; B1, B2, B3 and B4 are same or independently selected from substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C1 to C20 heteroalkyl, substituted or unsubstituted C6 to C20 aryl, substituted or unsubstituted C5 to C20 heteroaryl, or B1 and B2 form a ring; and b) p-dopants consisting of Li cation and an anion selected from perchlorate and tetrafluoroborate are excluded, and the first hole transport layer comprises a sublayer, wherein the electrical dopant is comprised in an amount, by weight and/or by volume, exceeding the total amount of other components which may additionally be comprised in the sublayer, and a method for preparing the same.
本发明涉及一种电子器件,在第一电极和第二电极之间包括至少一个第一空穴传输层,其中第一空穴传输层包括(i)至少一个由共价结合原子组成的第一空穴传输基质化合物和(ii)至少一个电p-掺杂剂,该电p-掺杂剂选自金属酸盐和电中性金属络合物,该金属络合物包括一个金属阳离子和至少一个阴离子和/或至少一个由至少4个共价结合原子组成的阴离子配体,其中电p-掺杂剂的金属阳离子选自碱金属、碱土金属、铅、锰、铁、钴、镍、锌、镉;氧化态(II)或(III)的稀土金属;Al、Ga、In;以及Sn、Ti、Zd;碱土金属、Pb、Me、Fe、Co、Ni、Zn、Cd;氧化态为 (II) 或 (III) 的稀土金属;Al、Ga、In;以及氧化态为 (TV) 或以下的 Sn、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo 和 W;条件是 a) p 掺杂剂包含具有通式 (Ia) 或 (Ib) 的阴离子或阴离子配体,其中 A1、A2、A3 和 A4 独立选自 CO、SO2 或 POR1;R1=从卤化物、腈、卤代或过卤代的 C1 至 C20 烷基、卤代或过卤代的 C6 至 C20 芳基或卤代或过卤代的具有 5 至 20 个成环原子的杂芳基所组成的组中选出的取电子基团;B1、B2、B3 和 B4 相同或独立选自取代或未取代的 C1 至 C20 烷基、取代或未取代的 C1 至 C20 杂烷基、取代或未取代的 C6 至 C20 芳基、取代或未取代的 C5 至 C20 杂芳基,或 B1 和 B2 形成一个环;b) 不包括由锂阳离子和选自高氯酸盐和四氟硼酸盐的阴离子组成的 p 掺杂剂,且第一空穴传输层包括一个子层,其中电掺杂剂的含量(按重量和/或体积计)超过子层中可能另外包含的其他成分的总量,以及制备该掺杂剂的方法。