2-amino-1-(1-hydroxymethyl-propylamino)-butane | 90272-72-3

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 2-amino-1-(1-hydroxymethyl-propylamino)-butane
• 英文别名: 2-Amino-1-(1-hydroxymethyl-propylamino)-butan；2-(2-Aminobutylamino)butan-1-ol；2-(2-aminobutylamino)butan-1-ol
• CAS: 90272-72-3
• 化学式: C₈H₂₀N₂O
• 分子量: 160.26
• InChiKey: KZZHQGOCVQYBMY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  11
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  58.3
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2-amino-1-(1-hydroxymethyl-propylamino)-butane 生成 2-benzoylamino-1-[benzoyl-(1-hydroxymethyl-propyl)-amino]-butane
  参考文献：
  名称：

  亚乙基亚胺的反应；与氨和胺。

  摘要：

  DOI：

  10.1021/ja01181a053
• 作为产物：
  描述：

  2-乙基氮丙啶 、 2-氨基-1-丁醇 在 氯化铵 作用下， 生成 2-amino-1-(1-hydroxymethyl-propylamino)-butane
  参考文献：
  名称：

  亚乙基亚胺的反应；与氨和胺。

  摘要：

  DOI：

  10.1021/ja01181a053

文献信息

• A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING
  申请人：AZ Electronic Materials USA Corp.

  公开号：EP2389612A1

  公开（公告）日：2011-11-30
• WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND METHOD FOR THE FORMATION OF MICROPATTERNS WITH THE SAME
  申请人：Hong Sung-Eun

  公开号：US20100119717A1

  公开（公告）日：2010-05-13

  A process which comprises applying a water-soluble resin composition comprising a water-soluble vinyl resin, a compound having at least two amino groups in the molecule, a solvent, and, if necessary, an additive such as a surfactant on a resist pattern ( 2 ) formed on a substrate ( 1 ) to form a water-soluble resin film ( 3 ) , modifying part of the water-soluble resin film adjacent to the resist pattern through mixing to form a water-insolubilized layer ( 4 ) which cannot be removed by water washing on the surface of the resist pattern, and removing unmodified part of the water-soluble resin film by water washing and which enables the effective scale-down of separation size and hole opening size of a resist pattern to a level finer than the limit of resolution of the wave length of exposure. It is preferable to use as the water-soluble vinyl resin a homopolymer of a nitrogen-containing vinyl monomer such as acrylamine, vinylpyrrolidone or vinylimidazole, a copolymer of two or more nitrogen-containing vinyl monomers, or a copolymer of at least one nitrogen-containing vinyl monomer and at least one nitrogen-free vinyl monomer.
• Photoresist Image-forming Process Using Double Patterning
  申请人：Cao Yi

  公开号：US20100183851A1

  公开（公告）日：2010-07-22

  A process for forming a double photoresist pattern is disclosed.
• [EN] A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING<br/>[FR] PROCÉDÉ DE FORMATION D'IMAGE DE PHOTORÉSERVE UTILISANT UNE DOUBLE FORMATION DE MOTIF
  申请人：AZ ELECTRONIC MATERIALS USA

  公开号：WO2010084372A1

  公开（公告）日：2010-07-29

  A process for forming a double photoresist pattern is disclosed.
• Reactions of Ethylenimines: With Ammonia and Amines
  作者：Leallyn B. Clapp

  DOI：10.1021/ja01181a053

  日期：1948.1

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