perfluorononanoic acid tetramethylammonium salt | 77032-26-9

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: perfluorononanoic acid tetramethylammonium salt
• 英文别名: tetramethylammonium perfluorononanoate；Tetramethyl-ammonium heptadecafluorononanoate；2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononanoate;tetramethylazanium
• CAS: 77032-26-9
• 化学式: C₄H₁₂N*C₉F₁₇O₂
• 分子量: 537.217
• InChiKey: ZQCWLWLNWRKEIQ-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  4.07
• 重原子数：
  33
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  40.1
• 氢给体数：
  0
• 氢受体数：
  19

反应信息

• 作为产物：
  描述：

  十七氟正壬酸乙酯 在 氢氧化钾 作用下， 以 水 、 丙酮 为溶剂， 生成 perfluorononanoic acid tetramethylammonium salt
  参考文献：
  名称：

  Herbst, L.; Hoffmann, H.; Kalus, J., Berichte der Bunsen-Gesellschaft, 1985, vol. 89, p. 1050 - 1064

  摘要：

  DOI：

文献信息

• Top coating composition for photoresist and method of forming photoresist pattern using same
  申请人：Hata Mitsuhiro

  公开号：US20060111550A1

  公开（公告）日：2006-05-25

  Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a base; and a solvent, wherein the polymer may be represented by Formula I: wherein R 1 and R 2 are independently selected from the group consisting of hydrogen, fluoro, methyl, and trifluoromethyl; X is a carboxylic acid group or a sulfonic acid group; Y is a carboxylic acid group or a sulfonic acid group, wherein the carboxylic acid group or sulfonic acid group is protected; Z is a monomer selected from the group consisting of a vinyl monomer, an alkyleneglycol, a maleic anhydride, an ethyleneimine, an oxazoline-containing monomer, acrylonitrile, an allylamide, a 3,4-dihydropyran, a 2,3-dihydrofuran, tetrafluoroethylene, or a combination thereof; and m, n, and q are integers wherein 0.03≦m/(m+n+q)≦0.97, 0.03≦n/(m+n+q)≦0.97, 0≦q/(m+n+q)≦0.5; and wherein the solvent includes deionized water.
• US7384730B2
  申请人：——

  公开号：US7384730B2

  公开（公告）日：2008-06-10
• Herbst, L.; Hoffmann, H.; Kalus, J., Berichte der Bunsen-Gesellschaft, 1985, vol. 89, p. 1050 - 1064
  作者：Herbst, L.、Hoffmann, H.、Kalus, J.、Reizlein, K.、Schmelzer, U.、Ibel, K.

  DOI：——

  日期：——