[Problem] To provide a film forming composition and a film forming method capable of forming a film excellent in gas barrier properties. [Means for Solution] A film forming composition comprising a polysilazane, an organic solvent and an additive having a specific structure, and a film forming method comprising applying the composition on a substrate and exposing the composition to light. This specific additive is represented by a specific general formula among those having a nonconjugated cyclic structure composed of atoms selected from the group consisting of carbon, nitrogen and oxygen in the structure.
[问题]提供一种成膜组合物和一种成膜方法,能够形成气体阻隔性能优异的薄膜。[解决方法]一种成膜组合物,由聚
硅氧烷、有机溶剂和具有特定结构的添加剂组成;以及一种成膜方法,包括将该组合物涂在基底上并将该组合物曝光。该特定添加剂由具有非共轭环状结构的添加剂中的一个特定通式表示,该结构中的原子选自碳、氮和氧组成的组。