申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20140357052A1
公开(公告)日:2014-12-04
The invention provides a substrate detergent composition used for cleaning a surface of a substrate, comprising: (A) A quaternary ammonium salt: 0.1 to 2.0% by mass; (B) Water: 0.1 to 0.4% by mass; and (C) An organic solvent: 94.0 to 99.8% by mass. There can be provided a substrate detergent composition used for cleaning a surface of a substrate contaminated with a silicone component whose water contact angle is 100° or more.
本发明提供了一种基板清洗剂组合物,用于清洗基板表面,包括:(A)季铵盐:按质量计0.1至2.0%;(B)水:按质量计0.1至0.4%;以及(C)有机溶剂:按质量计94.0至99.8%。可以提供一种基板清洗剂组合物,用于清洗表面受到硅组分污染的基板,其水接触角为100°或更高。