电子顺磁共振波谱证实,在甲基四氢呋喃基质中2,3-重氮萘-1,4-二酮(1)的光解形成2-(λ1-氮烷基)-3-叠氮萘-1,4-二酮(乙烯基硝烯32)。32(D / hc = 0.5338 cm-1,E / hc = 0.0038 cm-1)的零场分裂(zfs)参数显示出显着的1,3-双自由基特征。辐照32会生成2-(λ1-氮杂烷基)-1,3-二氧杂-2-,3-二氢-1H-茚基-2-腈(烷基氮化物33),其具有典型的环烷基氮化物的zfs参数(D / hc = 1.57 cm -1,并且E / hc = 0.00071 cm-1)。氩气基质中1的光解作用可验证32形成33。
电子顺磁共振波谱证实,在甲基四氢呋喃基质中2,3-重氮萘-1,4-二酮(1)的光解形成2-(λ1-氮烷基)-3-叠氮萘-1,4-二酮(乙烯基硝烯32)。32(D / hc = 0.5338 cm-1,E / hc = 0.0038 cm-1)的零场分裂(zfs)参数显示出显着的1,3-双自由基特征。辐照32会生成2-(λ1-氮杂烷基)-1,3-二氧杂-2-,3-二氢-1H-茚基-2-腈(烷基氮化物33),其具有典型的环烷基氮化物的zfs参数(D / hc = 1.57 cm -1,并且E / hc = 0.00071 cm-1)。氩气基质中1的光解作用可验证32形成33。
COMPOUND OR ITS TAUTOMER, METAL COMPLEX COMPOUND, COLORED PHOTOSENSITIVE CURING COMPOSITION, COLOR FILTER, AND PRODUCTION
申请人:MIZUKAWA Yuki
公开号:US20120238752A1
公开(公告)日:2012-09-20
Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness.
A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I):
wherein in Formula (I), R
1
to R
6
each independently represent a hydrogen atom or a substituent group; and R
7
represents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.
Photosensitive compound, photosensitive composition including the same, method of manufacturing the same
申请人:Korea Kumho Petrochemical Co., Ltd.
公开号:EP2289874A1
公开(公告)日:2011-03-02
Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
申请人:——
公开号:US20040167322A1
公开(公告)日:2004-08-26
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
Photosensitive Compound and Photosensitive Composition Including the Same
申请人:Park Joo Hyeon
公开号:US20110053084A1
公开(公告)日:2011-03-03
Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.
Photoacid generators, chemically amplified resist compositions, and patterning process
申请人:Ohsawa Youichi
公开号:US20070292768A1
公开(公告)日:2007-12-20
A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of the acetal type, resolution and top loss are improved. The composition is suited for deep UV lithography.