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2,3-diazidonaphthalene-1,4-dione | 6427-95-8

中文名称
——
中文别名
——
英文名称
2,3-diazidonaphthalene-1,4-dione
英文别名
[(3-diazonioimino-1,4-dioxonaphthalen-2-ylidene)hydrazinylidene]azanide
2,3-diazidonaphthalene-1,4-dione化学式
CAS
6427-95-8
化学式
C10H4N6O2
mdl
——
分子量
240.181
InChiKey
KPZYEIVQVXCDPN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.3
  • 重原子数:
    18
  • 可旋转键数:
    0
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    100
  • 氢给体数:
    0
  • 氢受体数:
    7

反应信息

  • 作为反应物:
    描述:
    2,3-diazidonaphthalene-1,4-dione2-甲基四氢呋喃 为溶剂, 生成 2-(λ1-azaneyl)-3-azidonaphthalene-1,4-dione
    参考文献:
    名称:
    在低温下将三重态乙烯基硝烯转化为三重态烷基硝烯。
    摘要:
    电子顺磁共振波谱证实,在甲基四氢呋喃基质中2,3-重氮萘-1,4-二酮(1)的光解形成2-(λ1-氮烷基)-3-叠氮萘-1,4-二酮(乙烯基硝烯32)。32(D / hc = 0.5338 cm-1,E / hc = 0.0038 cm-1)的零场分裂(zfs)参数显示出显着的1,3-双自由基特征。辐照32会生成2-(λ1-氮杂烷基)-1,3-二氧杂-2-,3-二氢-1H-茚基-2-腈(烷基氮化物33),其具有典型的环烷基氮化物的zfs参数(D / hc = 1.57 cm -1,并且E / hc = 0.00071 cm-1)。氩气基质中1的光解作用可验证32形成33。
    DOI:
    10.1021/acs.orglett.9b01950
  • 作为产物:
    描述:
    2,3-二溴-1,4-萘醌 在 sodium azide 作用下, 以 丙酮 为溶剂, 反应 24.0h, 以91%的产率得到2,3-diazidonaphthalene-1,4-dione
    参考文献:
    名称:
    在低温下将三重态乙烯基硝烯转化为三重态烷基硝烯。
    摘要:
    电子顺磁共振波谱证实,在甲基四氢呋喃基质中2,3-重氮萘-1,4-二酮(1)的光解形成2-(λ1-氮烷基)-3-叠氮萘-1,4-二酮(乙烯基硝烯32)。32(D / hc = 0.5338 cm-1,E / hc = 0.0038 cm-1)的零场分裂(zfs)参数显示出显着的1,3-双自由基特征。辐照32会生成2-(λ1-氮杂烷基)-1,3-二氧杂-2-,3-二氢-1H-茚基-2-腈(烷基氮化物33),其具有典型的环烷基氮化物的zfs参数(D / hc = 1.57 cm -1,并且E / hc = 0.00071 cm-1)。氩气基质中1的光解作用可验证32形成33。
    DOI:
    10.1021/acs.orglett.9b01950
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文献信息

  • COMPOUND OR ITS TAUTOMER, METAL COMPLEX COMPOUND, COLORED PHOTOSENSITIVE CURING COMPOSITION, COLOR FILTER, AND PRODUCTION
    申请人:MIZUKAWA Yuki
    公开号:US20120238752A1
    公开(公告)日:2012-09-20
    Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness. A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I): wherein in Formula (I), R 1 to R 6 each independently represent a hydrogen atom or a substituent group; and R 7 represents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.
    提供的是一种有用于原色彩色滤光片的彩色光敏固化组合物,包括蓝色、绿色和红色,具有高摩尔吸收系数,可减少薄膜厚度,具有优越的颜色纯度和牢固度。 一种彩色光敏固化组合物,包括作为其着色剂的从金属或金属化合物获得的基于二吡咯甲烷的金属配合物化合物和由以下式(I)表示的基于二吡咯甲烷的化合物,其中在式(I)中,R1至R6各自独立地表示氢原子或取代基;R7表示氢或卤素原子,或烷基、芳基或杂环基。
  • Photosensitive compound, photosensitive composition including the same, method of manufacturing the same
    申请人:Korea Kumho Petrochemical Co., Ltd.
    公开号:EP2289874A1
    公开(公告)日:2011-03-02
    Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.
    揭示了一种光敏化合物及其制造方法。该光敏化合物由至少含有一个萘醌二氮化苯并磺酸酯基团的化合物组成,该化合物在一个分子中具有至少一个含有1至8个碳原子的羧基或至少一个含有1至8个碳原子的烷氧基。
  • Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
    申请人:——
    公开号:US20040167322A1
    公开(公告)日:2004-08-26
    A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
    一种化学放大型抗蚀组合物,包括在苯环上的2-位含有长链烷氧基基团的特定苯磺酰二氮甲烷,具有许多优点,包括提高分辨率,改善焦点宽度,即使在长期PED上也减少线宽变化或形状退化,涂层、显影和剥离后减少残留物,并在显影后改善图案轮廓,因此适用于微加工。
  • Photosensitive Compound and Photosensitive Composition Including the Same
    申请人:Park Joo Hyeon
    公开号:US20110053084A1
    公开(公告)日:2011-03-03
    Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.
    揭示了一种感光化合物及其制造方法。该感光化合物由至少含有一个萘醌二氮化硫酸酯基团的萘醌二氮化硫酸酯化合物组成,并且在一个分子中具有至少一个含有1至8个碳原子的羧基或至少一个含有1至8个碳原子的烷氧基。
  • Photoacid generators, chemically amplified resist compositions, and patterning process
    申请人:Ohsawa Youichi
    公开号:US20070292768A1
    公开(公告)日:2007-12-20
    A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of the acetal type, resolution and top loss are improved. The composition is suited for deep UV lithography.
    一种光酸发生剂的化学式为(1)。包括该光酸发生剂的化学增感抗蚀组合物具有诸如高分辨率、焦点宽度、长期PED尺寸稳定性和令人满意的图案轮廓形状等优点。当该光酸发生剂与具有除了缩醛类型以外的酸敏感基团的树脂结合时,可以改善分辨率和顶部损失。该组合物适用于深紫外光刻。
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