3-ethyl-3-(4-hydroxybutyl)oxymethyloxetane | 889867-34-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧杂环丁烷
• 英文名称: 3-ethyl-3-(4-hydroxybutyl)oxymethyloxetane
• 英文别名: 4-[(3-ethyloxetan-3-yl)methoxy]butan-1-ol
• CAS: 889867-34-9
• 化学式: C₁₀H₂₀O₃
• 分子量: 188.267
• InChiKey: RBMGGZPJAZDWNE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  13
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  38.7
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  3-ethyl-3-(4-hydroxybutyl)oxymethyloxetane 、 丙烯酰氯 在 三乙胺 作用下， 以 二氯甲烷 为溶剂， 反应 2.0h， 以74%的产率得到3-ethyl-3-(4-acryloyloxybutyloxymethyl)oxetane
  参考文献：
  名称：

  OXETANE-RING-CONTAINING (METH)ACRYLIC ACID ESTER COMPOUND

  摘要：

  提供的是一种含氧杂环的（甲基）丙烯酸酯化合物，通过聚合可以得到高度柔韧或热稳定的固化制品。含氧杂环的（甲基）丙烯酸酯化合物由下式（1）表示，其中R1代表氢原子或烷基；R2代表氢原子或甲基；“A”代表以下式（a1）表示的线性烷基或以下式（a2）表示的支链烷基。

  公开号：

  US20120232295A1
• 作为产物：
  描述：

  3-乙基-3-氧杂丁环甲醇 在 sodium hydride 、 三乙胺 作用下， 以 四氢呋喃 、 二氯甲烷 为溶剂， 反应 16.17h， 生成 3-ethyl-3-(4-hydroxybutyl)oxymethyloxetane
  参考文献：
  名称：

  OXETANE-RING-CONTAINING (METH)ACRYLIC ACID ESTER COMPOUND

  摘要：

  提供的是一种含氧杂环的（甲基）丙烯酸酯化合物，通过聚合可以得到高度柔韧或热稳定的固化制品。含氧杂环的（甲基）丙烯酸酯化合物由下式（1）表示，其中R1代表氢原子或烷基；R2代表氢原子或甲基；“A”代表以下式（a1）表示的线性烷基或以下式（a2）表示的支链烷基。

  公开号：

  US20120232295A1

文献信息

• Resin composition for stereolithography
  申请人：CMET Inc.

  公开号：US08293448B2

  公开（公告）日：2012-10-23

  Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below: wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.

  提供的是一种用于立体光刻的树脂组合物，其在未固化状态下吸收的水和湿气很少，即使在高湿度下也能保持低吸湿率，并具有高固化敏感性，从而可以顺利地生产出具有尺寸精度、机械性能和尺寸稳定性等优良性能的立体光刻产品，以减少光照时间。该立体光刻用树脂组合物包括以下一般式（I）表示的环氧乙烷化合物：其中R1表示具有1到5个碳原子的烷基，R2表示具有2到10个碳原子的烷基，可能含有醚键，在立体光刻用树脂组合物的总质量基础上，按3至60质量％的比例。
• 3-ETHYLOXETHANE COMPOUND HAVING HYDROXYL GROUP AND METHOD FOR PRODUCING THE SAME
  申请人：Hirotsu Kenji

  公开号：US20100174098A1

  公开（公告）日：2010-07-08

  Disclosed is a 3-ethyloxethane compound having a hydroxyl group which is represented by the following general formula (1). (1) (In the formula, A represents an alkylene group having 3-5 carbon atoms which may have an ether bond or an alkylene group having 3-5 carbon atoms which may be substituted by a hydroxyl group.) The 3-ethyloxethane compound having a hydroxyl group can be produced by reacting a 3-ethyloxethane compound represented by the general formula (2) below, a diol compound represented by the general formula (3) below and a base. (2) (In the formula, X represents a leaving group.) (3) (In the formula, A is as defined above.)

  本发明涉及一种具有羟基的3-乙氧基乙烷化合物，其由以下通式（1）表示。（1）（在该式中，A表示具有3-5个碳原子的可具有醚键或可被羟基取代的烷基基团。）具有羟基的3-乙氧基乙烷化合物可以通过将以下通式（2）所表示的3-乙氧基乙烷化合物、以下通式（3）所表示的二元醇化合物以及碱反应而制得。（2）（在该式中，X表示离去基团。）（3）（在该式中，A如上所定义。）
• 3-ethyloxethane compound having hydroxyl group and method for producing the same
  申请人：UBE Industries, Ltd.

  公开号：US08247583B2

  公开（公告）日：2012-08-21

  Disclosed is a 3-ethyloxethane compound having a hydroxyl group which is represented by the following general formula (1). (1) (In the formula, A represents an alkylene group having 3-5 carbon atoms which may have an ether bond or an alkylene group having 3-5 carbon atoms which may be substituted by a hydroxyl group.) The 3-ethyloxethane compound having a hydroxyl group can be produced by reacting a 3-ethyloxethane compound represented by the general formula (2) below, a diol compound represented by the general formula (3) below and a base. (2) (In the formula, X represents a leaving group.) (3) (In the formula, A is as defined above.)

  本发明公开了一种具有羟基的3-乙氧基乙烷化合物，其由以下通式（1）表示。（1）（在公式中，A代表具有3-5个碳原子的可以具有醚键的烷基基团，或者可以被羟基取代的具有3-5个碳原子的烷基基团。）具有羟基的3-乙氧基乙烷化合物可以通过将以下通式（2）所表示的3-乙氧基乙烷化合物，以下通式（3）所表示的二元醇化合物和碱反应而制备。（2）（在公式中，X代表离去基团。）（3）（在公式中，A如上定义。）
• HETEROCYCLIC COMPOUND
  申请人：Takeda Pharmaceutical Company Limited

  公开号：US20150094296A1

  公开（公告）日：2015-04-02

  The present invention provides an agent for the prophylaxis or treatment of autoimmune diseases (e.g., psoriasis, rheumatoid arthritis, inflammatory bowel disease, Sjogren's syndrome, Behcet's disease, multiple sclerosis, systemic lupus erythematosus etc.) and the like, which has a superior Tyk2 inhibitory action. The present invention relates to a compound represented by the formula wherein each symbol is as defined in the specification, or a salt thereof.

  本发明提供了一种用于预防或治疗自身免疫性疾病（例如银屑病、类风湿性关节炎、炎症性肠病、干燥综合征、Behcet病、多发性硬化症、系统性红斑狼疮等）等的药剂，其具有优越的Tyk2抑制作用。本发明涉及一种由式所表示的化合物，其中每个符号如规范中所定义，或其盐。
• RESIN COMPOSITION FOR STEREOLITHOGRAPHY
  申请人：Ito Takashi

  公开号：US20090209674A1

  公开（公告）日：2009-08-20

  Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below; (wherein R 1 denotes an alkyl group having 1 to 5 carbon atoms, and R 2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond) in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.

  提供了一种用于立体光刻的树脂组合物，其在未固化状态下吸收的水分和湿气很少，即使在高湿度下也保持低的吸湿率，并具有高的固化敏感性，可以顺利生产出具有尺寸精度、机械性能和尺寸稳定性等优良性能的立体光刻产品，从而减少光照时间。该立体光刻用树脂组合物包括以下通式(I)所表示的环氧乙烷化合物；（其中R1表示1至5个碳原子的烷基，R2表示含有2至10个碳原子的烷基，可能含有醚键），其比例为3至60质量％，基于立体光刻用树脂组合物的总质量。