申请人:AIR PRODUCTS AND CHEMICALS, INC.
公开号:US10170297B2
公开(公告)日:2019-01-01
Described herein are compositions or formulations for forming a film in a semiconductor deposition process, such as without limitation, a flowable chemical vapor deposition of silicon oxide. Also described herein is a method to improve the surface wetting by incorporating an acetylenic alcohol or diol surfactant such as without limitation 3,5-dimethyl-1-hexyn-3-ol, 2,4,7,9-tetramethyl-5-decyn-4,7-diol, 4-ethyl-1-octyn-3-ol, and 2,5-dimethylhexan-2,5-diol, and other related compounds.
本文描述了用于在半导体沉积工艺中形成薄膜的组合物或配方,例如但不限于氧化硅的可流动化学气相沉积。本文还描述了一种通过加入乙炔醇或二元醇表面活性剂(如但不限于 3,5-二甲基-1-己炔-3-醇、2,4,7,9-四甲基-5-癸炔-4,7-二醇、4-乙基-1-辛炔-3-醇和 2,5-二甲基己-2,5-二醇及其他相关化合物)来改善表面润湿性的方法。