2,2-diphenyl-acenaphthen-1-one | 85925-12-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 2,2-diphenyl-acenaphthen-1-one
• 英文别名: 2,2-Diphenyl-acenaphthen-1-on；2-Oxo-1.1-diphenyl-acenaphthen；2,2-diphenyl-1(2H)-acenaphthylenone；1.1-Diphenyl-acenaphthenon-(2)；1(2H)-Acenaphthylenone, 2,2-diphenyl-；2,2-diphenylacenaphthylen-1-one
• CAS: 85925-12-8
• 化学式: C₂₄H₁₆O
• 分子量: 320.39
• InChiKey: LOAIIYHYHVVAME-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.8
• 重原子数：
  25
• 可旋转键数：
  2
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.04
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2,2-diphenyl-acenaphthen-1-one 在 水 、 tris(2,4-dibromophenyl)aminium hexachlorantimonate 作用下， 以 二氯甲烷 为溶剂， 生成 3,3-Diphenyl-1H,3H-naphtho<2>pyran-1-one
  参考文献：
  名称：

  Wilson, R. Marshall; Schnapp; Glos, Martin, Chemical Communications, 1997, # 2, p. 149 - 150

  摘要：

  DOI：
• 作为产物：
  描述：

  phenylmagnesium bromide 在 乙醚 、 硫酸 、 溶剂黄146 作用下， 生成 2,2-diphenyl-acenaphthen-1-one
  参考文献：
  名称：

  Wittig; Leo; Wiemer, Chemische Berichte, 1931, vol. 64, p. 2405,2409

  摘要：

  DOI：

文献信息

• MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20180101096A1

  公开（公告）日：2018-04-12

  A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R 1 represents a 2 n -valent group having 1 to 30 carbon atoms, or a single bond, each R 0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m 1 is independently an integer of 0 to 4, in which at least one m 1 is an integer of 1 to 4, each m 2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

  一种用于光刻的底层膜的材料，其中使用以下式(0)代表的化合物。(在式(0)中，每个X独立表示氧原子或硫原子，或非交联状态，R1表示具有1到30个碳原子的2n价基团，或者单键，每个R0独立表示具有1到30个碳原子的直链、支链或环烷基，具有6到30个碳原子的芳基，具有2到30个碳原子的直链、支链或环烯基，硫醇基，卤素基，硝基，氨基，羧基或羟基，烷基、烯基和芳基中每个可选包括氰酸基、硫醇基、卤素基、硝基、氨基、羧基、羟基、醚键、酮键或酯键，每个m1独立地为0到4的整数，其中至少一个m1为1到4的整数，每个m2独立地为0到3的整数，n为1到4的整数，每个p独立地为0或1。)
• Diamond and Amorphous Carbon MEMS
  作者：J.P. Sullivan、T.A. Friedmann、K. Hjort

  DOI：10.1557/mrs2001.68

  日期：2001.4

  The designer of microelectromechanical systems (MEMS) can increase MEMS performance either by improved mechanical design or by the selection of a MEMS material with improved mechanical performance. In the quest to identify highperformance MEMS materials, diamond and amorphous carbon have recently emerged as a promising class of materials.

  微机电系统（MEMS）的设计者可以通过改进机械设计或选择具有改进机械性能的MEMS材料来提高MEMS性能。在寻找高性能MEMS材料的过程中，钻石和非晶碳最近被认为是一类有前途的材料。
• Lithium Aluminum Hydride Reactions in Pyridine Solution. Reductive Cleavage of Ketones¹
  作者：Peter T. Lansbury

  DOI：10.1021/ja01463a042

  日期：1961.1

  logarithm. Oxidation of cis-Decalih-Commercial cis-decalin was purified by vapor phase chromatography. The hydrocarbon (6 8.) was added to a solution of.50 g. of sodium dichromate, 40 ml. of water and 141 g. of 72% perchloric acid in enough acetic acid to make 1 1. of solution. The oxidation was carried out at 8' for 30 min. The reaction mixture was worked up as described above for the oxidation of 3-methylheptane

  含有 5.1 克。通过气相色谱法分离 3-乙基戊烷。通过与高锰酸钾溶液一起振摇然后进行气相色谱法($6~1.3929)来纯化上述材料。通过将其溶解在10ml中进行最终纯化。醋酸，加入重铬酸钠和高氯酸的 90% 醋酸溶液，直到橙色持续存在。加入水，将烃溶于乙醚，用碳酸氢钠溶液洗涤并通过气相色谱分离。在 20 v. 的电离电位下测定的质谱表明存在至少 97% 的一种氘（基于母峰）。动力学方法。-将等体积的碳氢化合物在冰醋酸中的溶液（通过减压蒸馏从三氧化铬中纯化）和重铬酸钠 (2 XM ) 和高氯酸 (1.333 M) 在 90yc 乙酸中的溶液放置在已密封到 10 毫米的 Utube。贝克曼细胞。溶液在减压下脱气并达到25.0'。将溶液混合并通过倒置管转移到贝克曼池中。铬 (VI) 的消失速率随着 390 mp 吸光度的变化而变化。对数 (AA m ) 与时间的关系图给出了良好的线性关系。速率
• Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US10359701B2

  公开（公告）日：2019-07-23

  A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m1 is independently an integer of 0 to 4, in which at least one m1 is an integer of 1 to 4, each m2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

  一种用于形成光刻用底层薄膜的材料，其中使用了下式 (0) 所代表的化合物。 式（0）中，每个 X 独立地代表氧原子或硫原子，或非交联状态，R1 代表具有 1 至 30 个碳原子的 2n 价基团，或单键，每个 R0 独立地代表具有 1 至 30 个碳原子的直链、支链或环状烷基，具有 6 至 30 个碳原子的芳基，具有 2 至 30 个碳原子的直链、支链或环状烯基，硫醇基，卤素基，硝基，氨基、烷基、烯基和芳基各自可选地包括一个氰基、一个硫醇基、一个卤素基、一个硝基、一个氨基、一个羧酸基、一个羟基、一个醚键、一个酮键、一个羧酸基、一个羟基、一个烷基、一个烯基和一个芳基、醚键、酮键或酯键，每个 m1 独立地为 0 至 4 的整数，其中至少一个 m1 为 1 至 4 的整数，每个 m2 独立地为 0 至 3 的整数，n 为 1 至 4 的整数，每个 p 独立地为 0 或 1。)
• Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US10745372B2

  公开（公告）日：2020-08-18

  A compound represented by the following formula (1): wherein each X independently represents an oxygen atom or a sulfur atom, or non-crosslinking, R1 represents a single bond or a 2n-valent group having 1 to 30 carbon atoms, the group may have an alicyclic hydrocarbon group, a double bond, a hetero atom, or an aryl group having 6 to 30 carbon atoms, each R2 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, an aryloxy group having 6 to 30 carbon atoms, or a hydroxyl group, in which at least one R2 represents an alkoxy group having 1 to 30 carbon atoms or an aryloxy group having 6 to 30 carbon atoms, each m is independently an integer of 1 to 6, each p is independently 0 or 1, and n is an integer of 1 to 4.

  下式(1)所代表的化合物： 其中每个 X 独立地代表氧原子或硫原子或非交联，R1 代表单键或具有 1 至 30 个碳原子的 2n 价基团，该基团可以具有脂环烃基团、双键、杂原子或具有 6 至 30 个碳原子的芳基，每个 R2 独立地代表具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 1 至 30 个碳原子的烷氧基、具有 6 至 30 个碳原子的芳氧基或羟基，其中至少一个 R2 代表具有 1 至 30 个碳原子的烷氧基或具有 6 至 30 个碳原子的芳氧基，每个 m 独立地为 1 至 6 的整数，每个 p 独立地为 0 或 1，n 为 1 至 4 的整数。

表征谱图