申请人:Sumitomo Chemical Company, Limited
公开号:EP0945764A2
公开(公告)日:1999-09-29
A photoresist composition which is particularly useful as a chemical amplification type photoresist is provided, wherein the photoresist composition contains a resin having a structural unit represented by the following formula (I) :
wherein R1, R2 and R3 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R4 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 1 to 4 carbon atoms and R5 represents a hydrogen atom, alkyl group or aryl group, or R4 and R5 join together to form a ring, which may be heterocyclic; and R6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a hydroxyl group.
本发明提供了一种特别适用于化学放大型光刻胶的光刻胶组合物,其中该光刻胶组合物含有一种具有下式(I)所代表的结构单元的树脂:
其中 R1、R2 和 R3 各自独立地代表氢原子或具有 1 至 4 个碳原子的烷基;R4 代表氢原子、具有 1 至 4 个碳原子的烷基或具有 1 至 4 个碳原子的烷氧基,R5 代表氢原子、烷基或芳基,或 R4 和 R5 连接在一起形成环,该环可以是杂环;R6 代表氢原子、具有 1 至 4 个碳原子的烷基、具有 1 至 4 个碳原子的烷氧基或羟基。