CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20210371377A1
公开(公告)日:2021-12-02
A carboxylate represented by formula (I), a quencher and a resist composition including the same:
wherein R
1
, R
2
and R
3
each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH
2
— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO
2
—, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and X
1
represents a single bond, —CH
2
—, —O—, —S—, —CO—, —SO— or —SO
2
—.
一种以式(I)表示的羧酸盐、淬灭剂和包括该羧酸盐的抗蚀组合物:其中,R1、R2和R3分别表示卤素原子、氟代烷基或烃基,该烃基可以有取代基,烃基中包括的—CH2—可以被—O—、—CO—、—S—或—SO2—替换,m1表示0到5的整数,m2表示0到4的整数,m3表示0到3的整数,X1表示单键、—CH2—、—O—、—S—、—CO—、—SO—或—SO2—。