Methyl-<4-methyl-naphthyl-(1)-methyl>-sulfid | 100713-09-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: Methyl-<4-methyl-naphthyl-(1)-methyl>-sulfid
• 英文别名: Methyl-(4-methyl-naphthyl-(1)-methyl)-sulfid；1-Methyl-4-(methylsulfanylmethyl)naphthalene
• CAS: 100713-09-5
• 化学式: C₁₃H₁₄S
• 分子量: 202.32
• InChiKey: IEEXJBHQGVKUDQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  25.3
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  Methyl-<4-methyl-naphthyl-(1)-methyl>-sulfid 在 双氧水 作用下， 以 溶剂黄146 为溶剂， 生成 Methyl-<4-methyl-naphthyl-(1)-methyl>-sulfon
  参考文献：
  名称：

  924.一些取代的甲硫基甲基苯和萘与甲基碘的反应

  摘要：

  DOI：

  10.1039/jr9600004747
• 作为产物：
  描述：

  1-(溴甲基)-4-甲基萘 、 sodium thiomethoxide 以 甲醇 为溶剂， 生成 Methyl-<4-methyl-naphthyl-(1)-methyl>-sulfid
  参考文献：
  名称：

  924.一些取代的甲硫基甲基苯和萘与甲基碘的反应

  摘要：

  DOI：

  10.1039/jr9600004747

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130078579A1

  公开（公告）日：2013-03-28

  A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R 1 represents a monovalent organic group having 1 to 20 carbon atoms. R 2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R 2 is as defined in the above formula (1). X represents an electron attractive group. R 3 represents a monovalent organic group having 1 to 20 carbon atoms.

  一种辐射敏感的树脂组合物，包括一个酸发生剂，通过辐射放射线产生下式（1）所代表的化合物。在式（1）中，R1代表具有1至20个碳原子的一价有机基团。R2代表氢原子或具有1至20个碳原子的一价有机基团。式（1）所代表的化合物最好是由下式（1-1）所代表的化合物。在式（1-1）中，R2如上式（1）所定义。X代表电子吸引基团。R3代表具有1至20个碳原子的一价有机基团。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030170561A1

  公开（公告）日：2003-09-11

  A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I), 1 wherein Rf individually represents a fluorine atom or a trifluoromethyl group, and Ra represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1-20 carbon atoms, or a linear or branched fluoroalkyl group having 1-20 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms, or a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms. The radiation-sensitive resin composition of the present invention exhibits superior resolution, while maintaining high transparency to radiations and high dry etching resistance. The resin composition thus can greatly contribute to the lithography process that will become more and more minute in the future.

  一种辐射敏感的树脂组合物，包括（A）含有酸可解离基团的聚硅氧烷和（B）含有三氟甲烷磺酸或生成以下式（I）酸的化合物的光酸发生剂，其中Rf分别表示氟原子或三氟甲基基团，Ra表示氢原子，氟原子，具有1-20个碳原子的线性或支链烷基，或具有1-20个碳原子的线性或支链氟烷基，具有3-20个碳原子的取代或未取代的单价环烃基或具有3-20个碳原子的取代或未取代的单价环氟烃基。本发明的辐射敏感树脂组合物表现出优异的分辨率，同时保持对辐射的高透明度和高干法刻蚀抵抗力。因此，该树脂组合物可以为未来变得越来越微小的光刻工艺做出巨大贡献。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
  申请人：JSR Corporation

  公开号：US20130216951A1

  公开（公告）日：2013-08-22

  A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R 1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R 2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.

  一种辐射敏感的树脂组合物，包括聚合物、产生酸的剂和有机溶剂。聚合物包括从公式（1）表示的化合物衍生的第一结构单元和从公式（2）表示的化合物衍生的第二结构单元。R1代表具有价数为（a+2）的有机基团，该有机基团与构成内酯环的碳原子一起形成具有3到8个碳原子的环结构。R2代表氟原子、羟基、具有1到20个碳原子的有机基团或类似物。
• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP2325695A1

  公开（公告）日：2011-05-25

  A radiation-sensitive resin composition includes (A) a polymer, (B) a photoacid generator, (C) an acid diffusion controller, and (D) a solvent, the polymer (A) including a repeating unit (a-1) shown by the following general formula (a-1), and the acid diffusion controller (C) including at least one base selected from (C-1) a base shown by the following general formula (C-1) and (C-2) a photodegradable base. wherein R1 individually represent a hydrogen atom or the like, R represents a monovalent group shown by the above general formula (a'), R19 represents a chain-like hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain-like hydrocarbon group having 1 to 30 carbon atoms or the like, m and n are integers from 0 to 3 (m+n=1 to 3), and R2 and R3 individually represent a monovalent chain-like hydrocarbon group having 1 to 20 carbon atoms or the like, provided that the two R2 may bond to form a ring structure.

  一种辐射敏感树脂组合物包括（A）聚合物、（B）光酸发生器、（C）酸扩散控制器和（D）溶剂，聚合物（A）包括如下通式（a-1）所示的重复单元（a-1），酸扩散控制器（C）包括至少一种选自（C-1）如下通式（C-1）所示的碱和（C-2）可光降解碱的碱。 其中 R1 单独代表氢原子或类似物，R 代表上述通式（a'）所示的一价基团，R19 代表具有 1 至 5 个碳原子或类似物的链状烃基，A 代表具有 1 至 30 个碳原子或类似物的二价链状烃基，m 和 n 是 0 至 3 的整数（m+n=1 至 3），R2 和 R3 单独代表具有 1 至 20 个碳原子或类似物的一价链状烃基，条件是两个 R2 可以键合形成环状结构。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND
  申请人：JSR Corporation

  公开号：EP2623558A1

  公开（公告）日：2013-08-07

  A radiation-sensitive resin composition includes: a polymer having a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2); an acid generator; and an organic solvent. In the formula (1), R1 represents a ring structure having 3 to 8 carbon atoms taken together with a carbon atom constituting a lactone ring; R2 represents a fluorine atom, a hydroxyl group or an organic group having 1 to 20 carbon atoms; and a is an integer of 0 to 6. In a case where a is 2 or greater, a plurality of R2s are identical or different, or represent a ring structure taken together with each other. At least one group of R1 and R2 has a hetero atom or a halogen atom.

  一种辐射敏感树脂组合物包括：一种聚合物，其第一结构单元由式（1）表示的化合物衍生而来，第二结构单元由式（2）表示的化合物衍生而来；一种酸发生器；以及一种有机溶剂。在式 (1) 中，R1 代表具有 3 至 8 个碳原子的环结构，与一个碳原子一起构成内酯环；R2 代表氟原子、羟基或具有 1 至 20 个碳原子的有机基团；a 为 0 至 6 的整数。在 a 为 2 或更大的情况下，多个 R2 相同或不同，或彼此代表一个环结构。R1 和 R2 中至少有一个基团具有杂原子或卤原子。