spiro<1,3-dioxolane-2,9'-fluorene> | 165-37-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 芴
• 英文名称: spiro<1,3-dioxolane-2,9'-fluorene>
• 英文别名: Fluorenon-aethylenketal；Spiro[1,3-dioxolane-2,9'-fluorene]
• CAS: 165-37-7
• 化学式: C₁₅H₁₂O₂
• 分子量: 224.259
• InChiKey: HWZZDSFHFCOBDN-UHFFFAOYSA-N

物化性质

• 熔点：
  133-134 °C(Solv: ethyl ether (60-29-7))
• 沸点：
  382.7±37.0 °C(Predicted)
• 密度：
  1.28±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  17
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  spiro<1,3-dioxolane-2,9'-fluorene> 、 (三甲基硅基)甲基氯化镁 以 苯 为溶剂， 反应 24.0h， 以52%的产率得到9,9-bis(trimethylsilylmethyl)fluorene
  参考文献：
  名称：

  Geminal Disilylmethylation of Dioxolanes with Silylmethyl Grignard Reagents

  摘要：

  DOI：

  10.3987/com-99-s87
• 作为产物：
  描述：

  3',4'-dichloro-1',6'-dicyanospironorcarene>-2',5'-dione 、 乙二醇 、 乙腈 以56%的产率得到
  参考文献：
  名称：

  SHINGAKI, TADAO;KUMA, HIRO;KUSHI, YOSHIHIKO;NAGAI, TOSHIKAZU, BULL. CHEM. SOC. JAP., 62,(1989) N, C. 444-450

  摘要：

  DOI：

文献信息

• COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME
  申请人：TOYO GOSEI CO., LTD.

  公开号：US20200048191A1

  公开（公告）日：2020-02-13

  An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.

  一种酰铵盐和具有高灵敏度和优秀图案特性（如LWR）的组合物，最好用于利用第一活性能量射线（如电子束或极紫外线）和第二活性能量射线（如紫外线）的光刻工艺的光刻胶组合物。
• Reaction of 9-Diazofluorene with 2,3-Dichloro-5,6-dicyano-<i>p</i>-benzoquinone: The Structure and the Behaviors of the Resulting Product
  作者：Tadao Shingaki、Hiro Kuma、Yoshihiko Kushi、Toshikazu Nagai

  DOI：10.1246/bcsj.62.444

  日期：1989.2

  The title reaction gave 3′,4′-dichloro-1′,6′-dicyanospiro[fluorene]-9,7′-[3′]norcarene]-2′,5′-dione (2) in a good yield. Recrystallizations of 2 from solvents such as benzene, dioxane, acetonitrile, and acetone gave each molecular complex consisting of a 2/solvent molar ratio of 1:1. The structure of 2 was determined by the use of one complex, 2·CH3COCH3, by an X-ray crystallographic analysis, which

  标题反应以良好的收率得到3',4'-二氯-1',6'-二氰基螺[芴]-9,7'-[3']降芴烯]-2',5'-二酮(2)。2 从苯、二恶烷、乙腈和丙酮等溶剂中重结晶，得到每个分子复合物，其 2/溶剂摩尔比为 1:1。2 的结构是通过使用一种配合物 2·CH3COCH3，通过 X 射线晶体学分析确定的，这表明 2 和丙酮之间的相互作用不是很强。1H NMR 光谱和复合物的差热分析也显示了这种主客体相互作用。化合物2通过与乙二醇和1,3-丙二醇反应得到9-芴酮的相应螺缩醛。
• COMPOUNDS WITH TERMINAL HETEROARYLCYANOVINYLENE GROUPS AND THEIR USE IN ORGANIC SOLAR CELLS
  申请人：BASF SE

  公开号：US20160248021A1

  公开（公告）日：2016-08-25

  The present invention relates to a photoactive material comprising a donor substance and an acceptor substance, wherein the donor substance comprises or consists of one or more compounds of formula (I) described herein, or the acceptor substance comprises or consists of one or more compounds of formula (I) described herein, or the donor sub stance comprises or consists of a first compound of formula (I) described herein and the acceptor substance comprises a second compound of formula (I) described herein with the proviso that the first and second compound are not the same, as well as to an organic solar cell comprising said photoactive material. The present invention also relates to a photoelectric conversion device comprising or consisting of two or more organic solar cells comprising said photoactive material and to compounds of formula (I) as described herein for use as donor substance or as acceptor substance in a photoactive material. Further, the present invention relates to the use of a compound of formula (III) as described herein in the synthesis of a compound of formula (I) as described herein.

  本发明涉及一种光活性材料，包括给体物质和受体物质，其中，给体物质包括或由本文所述的一个或多个式(I)化合物组成，或受体物质包括或由本文所述的一个或多个式(I)化合物组成，或给体物质由本文所述的第一种式(I)化合物组成或构成，受体物质由本文所述的第二种式(I)化合物组成，但第一和第二种化合物不相同。此外，本发明还涉及包含该光活性材料的有机太阳能电池，以及由该光活性材料组成的两个或更多有机太阳能电池的光电转换装置。本发明还涉及用于光活性材料中的给体物质或受体物质的式(I)化合物，以及本文所述的式(III)化合物在合成本文所述的式(I)化合物中的使用。
• Composition and method for manufacturing device using same
  申请人：TOYO GOSEI CO., LTD.

  公开号：US11142495B2

  公开（公告）日：2021-10-12

  An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.

  一种鎓盐和一种具有高灵敏度和优异图案特性（如 LWR）的组合物，该组合物最好用于光刻工艺中的抗蚀剂组合物，该光刻工艺使用第一种活性能量射线（如电子束或极紫外线）和第二种活性能量射线（如紫外线）。
• US9917260B2
  申请人：——

  公开号：US9917260B2

  公开（公告）日：2018-03-13