Phenol, 4,4'-9H-fluoren-9-ylidenebis[3-methyl- | 167953-74-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 芴
• 英文名称: Phenol, 4,4'-9H-fluoren-9-ylidenebis[3-methyl-
• 英文别名: 4-[9-(4-hydroxy-2-methylphenyl)fluoren-9-yl]-3-methylphenol
• CAS: 167953-74-4
• 化学式: C₂₇H₂₂O₂
• 分子量: 378.5
• InChiKey: KBKLXLYSUOMJQE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.7
• 重原子数：
  29
• 可旋转键数：
  2
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

文献信息

• Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
  申请人：Ohsawa Youichi

  公开号：US20100119970A1

  公开（公告）日：2010-05-13

  There is disclosed a resist lower-layer composition configured to be used by a multi-layer resist method used in lithography to form a layer lower than a photoresist layer acting as a resist upper layer film, wherein the resist lower-layer composition becomes insoluble or poorly-soluble in an alkaline developer after formation of the lower layer, and wherein the resist lower-layer composition comprises, at least, a thermal acid generator for generating an acid represented by the general formula (1) by heating at a temperature of 100° C. or higher. RCOO—CH 2 CF 2 SO 3 − H + (1) There can be provided a resist lower-layer composition in a multi-layer resist method (particularly, a two-layer resist method and a three-layer resist method), which composition is used to form a layer lower than a photoresist layer acting as a resist upper layer film, which composition becomes insoluble or poorly-soluble in an alkaline developer after formation of the lower layer, and which composition is capable of forming a resist lower layer film, intermediate-layered film, and the like having a higher anti-poisoning effect and exhibiting a lower load to the environment.

  揭示了一种抗性下层组合物，配置为在光刻中使用的多层抗性方法中使用，用于形成低于作为抗性上层膜的光刻胶层的一层，其中抗性下层组合物在形成下层后变得不溶解或难溶解于碱性显影剂中，且抗性下层组合物至少包括用于通过在100°C或更高温度下加热生成由通式（1）表示的酸的热酸发生剂。 可以提供一种抗性下层组合物，用于多层抗性方法（特别是双层抗性方法和三层抗性方法），该组合物用于形成低于作为抗性上层膜的光刻胶层的一层，该组合物在形成下层后变得不溶解或难溶解于碱性显影剂中，并且该组合物能够形成具有更高抗毒性效果并表现出对环境负荷较低的抗性下层膜、中间层膜等。
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• METHOD FOR PRODUCING FLUORENE DERIVATIVE
  申请人：Fujii Katsuhiro

  公开号：US20120029244A1

  公开（公告）日：2012-02-02

  A method for producing a fluorene derivative by reacting fluorenone with a phenol or a phenoxyalcohol in the presence of an acid catalyst includes: adding an alkali to an obtained reaction liquid containing a fluorene derivative; and concentrating a resultant mixture liquid without removing the alkali thus added and a reaction product of the alkali, thereby separating an unreacted phenol or unreacted phenoxyalcohol.

  一种制备芴衍生物的方法，通过在酸催化剂存在下将芴酮与苯酚或苯氧乙醇反应，包括以下步骤：向含有芴衍生物的反应液中加入碱；在不去除已添加的碱和碱的反应产物的情况下浓缩混合液，从而分离未反应的苯酚或未反应的苯氧乙醇。
• OPTICAL FILM
  申请人：MOTOYOSHI Tetsuya

  公开号：US20130005939A1

  公开（公告）日：2013-01-03

  An optical film comprising a copolycarbonate composed of 25 to 90 mol % of unit (A) of the following formula, and 10 to 75 mol % of unit (B) of the following formula, wherein the substituents are defined herein, and the optical film satisfies the following expression (1), R(450)

  一种光学薄膜，包括由以下公式的25-90摩尔％的单元（A）和以下公式的10-75摩尔％的单元（B）组成的共聚碳酸酯，其中取代基在此定义，且光学薄膜满足以下式（1）：R（450）
• Polycarbonate resin and optical article used the same
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP1138714A2

  公开（公告）日：2001-10-04

  A polycarbonate resin obtained by reaction of (A) a bisphenol compound having a fluorene structure, (B) a bisphenol compound having a polysiloxane structure, (C) other specific bisphenol compound and a carbonic acid ester-forming compound, wherein an amount of (A) bisphenol compound is 30 to 80 % by weight to total amount of (A) bisphenol compound and (B) bisphenol compound,and an amount of (C) bisphenol compound is 1 to 80 % by weight to total amount of (A) bisphenol compound, (B) bisphenol. compound and (C) bisphenol compound,and an intrinsic viscosity of said polycarbonate resin is 0.2 to 1.0 dl/g.

  一种聚碳酸酯树脂，由(A)具有芴结构的双酚化合物、(B)具有聚硅氧烷结构的双酚化合物、(C)其他特定双酚化合物和碳酸酯形成化合物反应而得、其中(A)双酚化合物的用量占(A)双酚化合物和(B)双酚化合物总量的重量比为 30%至 80%，(C)双酚化合物的用量占(A)双酚化合物、(B)双酚化合物和(C)双酚化合物总量的重量比为 1%至 80%。所述聚碳酸酯树脂的固有粘度为 0.2 至 1.0 分升/克。