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3-[4-(二甲基氨基)苯基]丙酸 | 73718-09-9

中文名称
3-[4-(二甲基氨基)苯基]丙酸
中文别名
——
英文名称
3-[4-(dimethylamino)phenyl]propanoic acid
英文别名
——
3-[4-(二甲基氨基)苯基]丙酸化学式
CAS
73718-09-9
化学式
C11H15NO2
mdl
MFCD06823974
分子量
193.246
InChiKey
YEETZXRKMHAPRM-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    184-185 °C
  • 沸点:
    341.6±17.0 °C(Predicted)
  • 密度:
    1.127±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1.6
  • 重原子数:
    14
  • 可旋转键数:
    4
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.363
  • 拓扑面积:
    40.5
  • 氢给体数:
    1
  • 氢受体数:
    3

安全信息

  • 海关编码:
    2922499990
  • 危险性防范说明:
    P261,P305+P351+P338
  • 危险性描述:
    H302,H315,H319,H335
  • 储存条件:
    室温密封,干燥保存。

SDS

SDS:c952e305b5d84383a921c9a2694a66a8
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上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    参考文献:
    名称:
    522.双季铵盐。第三部分 4-烷基苯-1:ω-双三烷基铵盐
    摘要:
    DOI:
    10.1039/jr9570002706
  • 作为产物:
    描述:
    4-(二甲基氨基)苯乙醇吡啶硫酸 作用下, 以 二甲基亚砜 为溶剂, 反应 4.0h, 生成 3-[4-(二甲基氨基)苯基]丙酸
    参考文献:
    名称:
    Long-range exciton coupling from dipyrrinone chromophores
    摘要:
    Dipyrrinone chromophores, attached by their acid termini to give (1R,2R)-cyclohexanediol dipropionate and diacetate esters (xanthobilirubinate and nor-xanthobilirubinate, respectively), interact through exciton coupling, as evidenced by intense bisignate circular dichroism Cotton effects for the pigment's long wavelength transition. The bis-xanthobilirubinate exhibits the expected negative exciton chirality (DELTA-epsilon-439max -16, DELTA-epsilon-382max + 22, CH2Cl2) but the bis-norxanthobilirubinate exhibits positive exciton chirality (DELTA-epsilon-420max + 38, DELTA-epsilon-367max -46, CH2Cl2).
    DOI:
    10.1016/s0040-4020(01)80716-x
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文献信息

  • Discovery and Optimization of Small-Molecule Ligands for the CBP/p300 Bromodomains
    作者:Duncan A. Hay、Oleg Fedorov、Sarah Martin、Dean C. Singleton、Cynthia Tallant、Christopher Wells、Sarah Picaud、Martin Philpott、Octovia P. Monteiro、Catherine M. Rogers、Stuart J. Conway、Timothy P. C. Rooney、Anthony Tumber、Clarence Yapp、Panagis Filippakopoulos、Mark E. Bunnage、Susanne Müller、Stefan Knapp、Christopher J. Schofield、Paul E. Brennan
    DOI:10.1021/ja412434f
    日期:2014.7.2
    compound bound to the CREB binding protein (CBP) and the first bromodomain of BRD4 (BRD4(1)) were used to guide the design of more selective compounds. The crystal structures obtained revealed two distinct binding modes. By varying the aryl substitution pattern and developing conformationally constrained analogues, selectivity for CBP over BRD4(1) was increased. The optimized compound is highly potent (Kd
    缺乏针对溴结构域和末端外 (BET) 亚家族之外的溴结构域的小分子抑制剂。在这里,我们描述了人类赖氨酸乙酰转移酶 CBP/p300 溴结构域模块的高效和选择性配体,由一系列 5-异恶唑基苯并咪唑开发而成。我们的出发点是片段命中,使用 Suzuki 偶联、苯并咪唑形成反应和还原胺化的平行合成将其优化为更有效和选择性更强的先导化合物。使用热稳定性测定法研究了先导化合物对其他溴结构域家族成员的选择性,结果显示对结构相关的 BET 家族成员有一些抑制作用。为了解决 BET 选择性问题,与 CREB ​​结合蛋白 (CBP) 和 BRD4 的第一个溴结构域 (BRD4(1)) 结合的先导化合物的 X 射线晶体结构用于指导更具选择性的化合物的设计。获得的晶体结构揭示了两种不同的结合模式。通过改变芳基取代模式和开发构象受限的类似物,增加了 CBP 超过 BRD4(1) 的选择性。优化后的化合物具有高效 (Kd
  • Process for the preparation of carboxylic acids and derivatives of them
    申请人:Biogal Gyogyszergrar
    公开号:US05350872A1
    公开(公告)日:1994-09-27
    The subject matter of the invention is a process for the preparation of carboxylic acids and derivatives of them of the general formula ##STR1## wherein R means hydrogen, or a C.sub.1-4 alkyl or a (C.sub.1-5 alkoxy)carbonyl group, R.sub.1 is as defined in claim 1, R.sub.7 stands for hydrogen or a C.sub.1-7 alkyl group and R.sub.8 means hydrogen or a carboxyl group, by reacting a 1,3-dioxane-4,6-dione derivative of the general formula ##STR2## wherein R.sub.9 stands for a C.sub.1-4 alkyl group or a phenyl group, optionally monosubstituted by halogen and R.sub.10 stands for hydrogen or a C.sub.1-5 alkyl group or R.sub.9 and R.sub.10 together form a pentamethylene group, and an aldehyde or ketone of the general formula ##STR3## in the presence of formic acid.
    本发明的主题是一种用于制备通式##STR1##的羧酸及其衍生物的过程,其中R表示氢,或C.sub.1-4烷基或(C.sub.1-5烷氧基)甲酰基,R.sub.1如权利要求1中定义,R.sub.7代表氢或C.sub.1-7烷基团,R.sub.8表示氢或羧酸基团,通过将通式##STR2##的1,3-二氧杂环己烷-4,6-二酮衍生物与通式##STR3##的醛或酮在甲酸存在下反应。其中R.sub.9代表C.sub.1-4烷基或苯基,可选地被卤素单取代,R.sub.10代表氢或C.sub.1-5烷基,或R.sub.9和R.sub.10共同形成一个五亚甲基基团。
  • [EN] KDM INHIBITORS AND USES THEREOF<br/>[FR] INHIBITEURS DE KDM ET LEURS UTILISATIONS
    申请人:DANA FARBER CANCER INST INC
    公开号:WO2021050702A1
    公开(公告)日:2021-03-18
    Provided herein are compounds that inhibit histone lysine demethylase (KDM) and pharmaceutically acceptable salts, hydrates, solvates, polymorphs, co-crystals, tautomers, stereoisomers, isotopically labeled derivatives, and prodrugs thereof, pharmaceutical compositions thereof, and methods of treating or preventing diseases (e.g., proliferative diseases, e.g., cancer). In certain embodiments, the compounds described herein are represented by formulas (I) and (II).
    本文提供了抑制组蛋白赖氨酸去甲基化酶(KDM)的化合物,以及其药用可接受的盐、水合物、溶剂合物、多型体、共晶体、互变异构体、立体异构体、同位素标记衍生物和其前药,以及其药物组合物和治疗或预防疾病(例如,增殖性疾病,例如癌症)的方法。在某些实施例中,本文描述的化合物由以下式(I)和(II)表示。
  • Resist composition and patterning process
    申请人:Watanabe Satoshi
    公开号:US20100009299A1
    公开(公告)日:2010-01-14
    The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F 2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.
    本发明涉及一种抗蚀组合物,例如用于在抗蚀物的基板侧边界面上提供优异图案轮廓的化学增感抗蚀组合物,除了在微细加工的光刻工艺中具有更高的分辨率外,特别是在采用KrF激光、ArF激光、F2激光、超短紫外光、电子束、X射线等作为曝光光源的光刻工艺中;以及利用该抗蚀组合物的图案化工艺。本发明提供一种化学增感抗蚀组合物,其包括一种或多种胺化合物或胺氧化合物(除了那些在芳香环的环结构中不含有胺或胺氧原子的氮原子的化合物),至少具有一个羧基,并且没有氢原子共价键结合到氮原子作为碱性中心。
  • Amide derivatives and intermediates for the synthesis thereof
    申请人:Terumo Kabushiki Kaisha
    公开号:US06069149A1
    公开(公告)日:2000-05-30
    Novel compounds which are amide derivatives represented by general formula (I) and medicinal preparations containing the same having an eosinophilic infiltration inhibitory effect based on a potent interferon (.alpha.,.gamma.)-inducing activity and an exellent percutaneous absorbability and being efficacious in treating allergic inflammatory diseases such as atopic dermatitis, various tumors and viral diseases. In said formula, each symbol has the following meaning: R.sub.1 and R.sub.2 : each lower alkyl, etc.; X and Y: independently representing each oxygen, NR.sub.4, CR.sub.5 etc. (wherein R.sub.4 and R.sub.5 independently represent each hydrogen, an aromatic group, etc.); Z: an aromatic ring or heterocycle; R.sub.3 : hydrogen, lower alkoxy, etc.; g, i and k: independently representing each an integer of from 0 to 6; h, i and l: independently representing each an integer of 0 or 1; m: an integer of from 0 to 5; and n: an integer of from 2 to 12.
    一种新型化合物,其为一般式(I)表示的酰胺衍生物,以及含有该化合物的药物制剂,具有基于强效干扰素(α,γ)诱导活性和优良的经皮吸收性的嗜酸性粒细胞浸润抑制作用,并且在治疗特应性皮炎、各种肿瘤和病毒性疾病等过敏性炎症性疾病方面具有疗效。在所述的式中,每个符号具有以下含义:R.sub.1 和 R.sub.2:各自为低碳烷基等;X 和 Y:独立地分别表示氧、NR.sub.4、CR.sub.5等(其中R.sub.4 和 R.sub.5 独立地表示氢、芳香族基等);Z:芳香环或杂环;R.sub.3:氢、低碳氧烷基等;g、i 和 k:独立地分别表示从0到6的整数;h、i 和 l:独立地分别表示0或1的整数;m:从0到5的整数;n:从2到12的整数。
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