3-Methoxy-6,9,9-trimethylfluorene | 1016668-32-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 芴
• 英文名称: 3-Methoxy-6,9,9-trimethylfluorene
• CAS: 1016668-32-8
• 化学式: C₁₇H₁₈O
• 分子量: 238.329
• InChiKey: BPANPPAXSHSQJT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  18
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  在 silver trifluoromethanesulfonate 作用下， 以 二氯甲烷 为溶剂， 反应 0.25h， 生成 3-Methoxy-6,9,9-trimethylfluorene 、 2-Isopropenyl-3'-methoxy-5-methyl-biphenyl
  参考文献：
  名称：

  Fluorenes and Styrenes by Au(I)-Catalyzed Annulation of Enynes and Alkynes

  摘要：

  Intermolecular annulation of enynes and propargyl esters to selectively produce styrenes or fluorenes is reported. The divergent arene syntheses involve a Au-catalyzed, two-pot, multistep process proceeding cis-diastereoselective cyclopropanation, cycloisomerization, and, finally, annulation or elimination.

  DOI：

  10.1021/ja710990d

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20180120701A1

  公开（公告）日：2018-05-03

  According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.