Alkoxide compound, thin film-forming starting material, and thin film formation method
申请人:ADEKA CORPORATION
公开号:US10011623B2
公开(公告)日:2018-07-03
The alkoxide compound of the present invention is characteristically represented by the following general formula (I):
本发明的烷氧基化合物特征性地由以下通式 (I) 表示: