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2-(9-Oxo-9H-fluoren-2-yl)-propionic acid | 42914-93-2

中文名称
——
中文别名
——
英文名称
2-(9-Oxo-9H-fluoren-2-yl)-propionic acid
英文别名
2-(9-Oxofluoren-2-yl)propanoic acid
2-(9-Oxo-9H-fluoren-2-yl)-propionic acid化学式
CAS
42914-93-2
化学式
C16H12O3
mdl
——
分子量
252.269
InChiKey
VHGPPZBGPITTBF-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.6
  • 重原子数:
    19
  • 可旋转键数:
    2
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.12
  • 拓扑面积:
    54.4
  • 氢给体数:
    1
  • 氢受体数:
    3

文献信息

  • PHOTOCURABLE COMPOSITION
    申请人:Fukui Hiroji
    公开号:US20110097669A1
    公开(公告)日:2011-04-28
    The present invention provides a photocurable composition which contains a photobase generator capable of generating a satisfactory amount of a base in a high quantum yield when irradiated even with a small quantity of light for a short time, and contains a curable compound that is rapidly cured by the generated base such that the composition is cured into a cured product. The photocurable composition comprises: a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by the following formula (1-1) with a basic compound (a2), and a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group, where R1 to R7 in the above formula (1-1) each are hydrogen or an organic group, R1 to R7 may be the same or different, and two of R1 to R7 may be bonded to each other to form a ring structure.
    本发明提供了一种光固化组合物,其包含一种光碱发生剂,当短时间内用少量光照射时,能够生成足量碱,并且具有高量子产率,同时含有一种可固化化合物,该化合物能够被生成的碱迅速固化,从而使组合物固化成为固化产物。该光固化组合物包括:光碱发生剂(A),其是由下式(1-1)所表示的羧酸盐(a1-1)与碱性化合物(a2)形成的,以及一种可固化化合物(B),该化合物在一个分子中具有至少两种官能团,所述官能团选自环氧基团、(甲基)丙烯酰基团、异氰酸酯基团、酸酐基团和烷氧基基团,其中上述式(1-1)中的R1至R7分别为氢或有机基团,R1至R7可以相同或不同,其中两个R1至R7可以相互连接形成环结构。
  • Active ray curable composition, active ray curable ink composition for inkjet printing, active ray curable adhesive composition, and method for stabilizing active ray curable composition
    申请人:Ricoh Company, Ltd.
    公开号:EP2647676A2
    公开(公告)日:2013-10-09
    An active ray curable composition, including: a photobase generator; a polymerizable compound; and an acid, wherein the photobase generator is a salt of a carboxylic acid and a basic compound, wherein a ratio by mole of a carboxyl group of the carboxylic acid : a basic functional group of the basic compound is 1 : 1, and wherein the acid is an acid that loses a function thereof as acid by light or heat.
    一种活性射线固化组合物,包括:一种光碱发生器;一种可聚合化合物;以及一种酸,其中光碱发生器是一种羧酸和一种碱性化合物的盐,其中羧酸的羧基与碱性化合物的碱性官能团的摩尔比为 1:1,而酸是一种在光或热作用下失去其作为酸的功能的酸。
  • THERMALLY DECOMPOSABLE POLYMER COMPOSITIONS INCORPORATING THERMALLY ACTIVATED BASE GENERATORS
    申请人:Tsang W. C. Peter
    公开号:US20120318854A1
    公开(公告)日:2012-12-20
    Embodiments in accordance with the present invention provide sacrifical polymer compositions and methods for fabricating electronic devices using such sacrifical polymer compositions where such methods include (1) providing a tacky sacrifical polymer composition that holds components in a desired alignment to one another, (2) providing solder fluxing for effecting electrical coupling; and (3) thermal decomposition or depolymerization of the sacrificial polymer composition to provide essentially residue free surfaces.
  • ACTIVE RAY CURABLE COMPOSITION, ACTIVE RAY CURABLE INK COMPOSITION FOR INKJET PRINTING, ACTIVE RAY CURABLE ADHESIVE COMPOSITION, AND METHOD FOR STABILIZING ACTIVE RAY CURABLE COMPOSITION
    申请人:NOGUCHI Soh
    公开号:US20130267625A1
    公开(公告)日:2013-10-10
    An active ray curable composition, including: a photobase generator; a polymerizable compound; and an acid, wherein the photobase generator is a salt of a carboxylic acid and a basic compound, wherein a ratio by mole of a carboxyl group of the carboxylic acid:a basic functional group of the basic compound is 1:1, and wherein the acid is an acid that loses a function thereof as acid by light or heat.
  • US20140275316A1
    申请人:——
    公开号:US20140275316A1
    公开(公告)日:2014-09-18
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