A series of novel single source precursors, [WECl4(E′nBu2)] (E = S or Se; E′ = S or Se), are developed in this work to deposit stoichiometric WS2xSe2−2x (0 ≤ x ≤ 1) binary and ternary thin films.
本研究开发了一系列新型单源前驱体 [W
ECl4(E′nBu2)](E = S 或 Se;E′ = S 或 Se),用于沉积符合
化学计量的 WS2xSe2-2x(0 ≤ x ≤ 1)二元和三元薄膜。