n-乙基-n-1-萘硫脲 | 4366-50-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 中文名称: n-乙基-n-1-萘硫脲
• 英文名称: N-Ethyl-N-α-naphthylthioharnstoff
• 英文别名: N-ethyl-N-[1]naphthyl-thiourea；N-Aethyl-N-[1]naphthyl-thioharnstoff；N-Ethyl-N-1-naphthylthiourea；1-ethyl-1-naphthalen-1-ylthiourea
• CAS: 4366-50-1
• 化学式: C₁₃H₁₄N₂S
• 分子量: 230.334
• InChiKey: KIJJAHDWPAWNGH-UHFFFAOYSA-N

物化性质

• 沸点：
  385.9±25.0 °C(Predicted)
• 密度：
  1.1345 (rough estimate)

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.15
• 拓扑面积：
  28.1
• 氢给体数：
  2
• 氢受体数：
  2

安全信息

• 海关编码：
  2930909090

反应信息

• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 硫氰酸铵 、 氯苯 作用下， 生成 n-乙基-n-1-萘硫脲
  参考文献：
  名称：

  DE604639

  摘要：

  公开号：

文献信息

• INHIBITOR COMPOSITION FOR RACKS WHEN USING CHROME FREE ETCHES IN A PLATING ON PLASTICS PROCESS
  申请人：ENTHONE, INCORPORATED

  公开号：EP3059277A1

  公开（公告）日：2016-08-24

  The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.

  本发明涉及一种用于抑制聚合物表面电化学金属电镀的水性抑制组合物，所述抑制组合物包含一种选自至少有一个硫原子和至少有一个氮原子的化合物组的抑制剂，还涉及一种抑制机架绝缘表面的方法。本发明的抑制剂组合物能够提供一种解决方案，当在塑料电镀工艺中使用非变色蚀刻法时，禁止在机架的绝缘区域出现意外金属化。
• Inhibitor Composition for Racks When Using Chrome Free Etches in a Plating on Plastics Process
  申请人：MACDERMID ENTHONE, INC.

  公开号：US20180044813A1

  公开（公告）日：2018-02-15

  The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.