(+/-)-3t--acrylsaeure | 90199-80-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧烷类
• 英文名称: (+/-)-3t--acrylsaeure
• 英文别名: 3-(Oxan-2-yl)prop-2-enoic acid；(E)-3-(oxan-2-yl)prop-2-enoic acid
• CAS: 90199-80-7
• 化学式: C₈H₁₂O₃
• 分子量: 156.181
• InChiKey: DISXWPLMEQRZBP-SNAWJCMRSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• New 4-arylpiperidine derivatives for the treatment of pruritus
  申请人：——

  公开号：US20030004340A1

  公开（公告）日：2003-01-02

  There is provided a compound of formula I, 1 wherein Het 1 , R 1 , R 2 , R 3 , X and n have meanings given in the description, which are useful in the prophylaxis and in the treatment of diseases mediated by opiate receptors, such as pruritus.

  提供了一种公式I的化合物，其中Het1、R1、R2、R3、X和n具有说明书中给出的含义，它们在通过阿片受体介导的疾病的预防和治疗中是有用的，例如瘙痒。
• Novel 4-phenylpiperidines for the treatment of pruritic dermatoses
  申请人：——

  公开号：US20030078282A1

  公开（公告）日：2003-04-24

  Novel compounds having general formula (I), and pharmaceutically and veterinarily acceptable salts thereof wherein R 1, R 2, R 3, W, Y 1, Y 2, X, n and y are as defined above and processes for their preparation and intermediate compounds prepared therein. The novel compounds are useful for having utility in the treatment. of pruritic dermatoses including allergic dermatitis and atopy in animals and humans

  具有通用公式(I)的新化合物，以及药物和兽药可接受的盐，其中R 1、R 2、R 3、W、Y 1、Y 2、X、n和y如上所述定义，以及它们的制备过程和其中制备的中间化合物。这些新化合物在治疗包括动物和人类的瘙痒性皮肤病，包括过敏性皮炎和异位症方面具有用途。
• Compounds useful in therapy
  申请人：Pfizer Inc.

  公开号：US20020099214A1

  公开（公告）日：2002-07-25

  There is provided a compound of formula I, 1 wherein R 1 , R 2 , R 3 and Y have meanings given in the description, which are useful in the prophylaxis and in the treatment of pruritus.

  提供了一个式I的化合物， 其中R1、R2、R3和Y的含义如描述中所示，在瘙痒的预防和治疗中有用。
• Underlayer Coating Forming Composition For Lythography Containing Compound Having Protected Carboxyl Group
  申请人：Takei Satoshi

  公开号：US20080102649A1

  公开（公告）日：2008-05-01

  There is provided an underlayer coating forming composition for lithography that is used in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to photoresists, does not intermix with photoresists, and is capable of flattening the surface of a semi conductor substrate having holes of a high aspect ratio. The underlayer coating forming composition for lithography comprises, a compound having two or more protected carboxylic groups, a compound having two or more epoxy groups, and a solvent.

  提供了一种用于半导体器件制造的光刻下层涂层形成组合物，该组合物在与光刻胶相比具有较高的干法蚀刻速率，不与光刻胶混合，并能够使具有高纵横比孔的半导体衬底表面变平。该光刻下层涂层形成组合物包括：具有两个或更多保护羧基的化合物、具有两个或更多环氧基的化合物和溶剂。
• Process for producing a crosslinked polymerizate for dental purposes
  申请人：DENTSPLY INTERNATIONAL, INC.

  公开号：EP0032124A2

  公开（公告）日：1981-07-15

  The invention relates to a process for producing a crosslinked polymerizate which can be employed in the dental field and with high swelling rate by copolymerization of at least one monomer with at least one crosslinking agent with at least two isolated double bonds, characterized in that for increasing the swelling rate, a surface layer of the obtained partially crosslinked polymerizate particles is subjected to a structure disaggregation by incorporating a non-crosslinking monomer and subsequent polymerization thereof and/or by physical action.

  本发明涉及一种通过至少一种单体与至少一种具有至少两个孤立双键的交联剂的共聚合，生产可用于牙科领域且具有高溶胀率的交联聚合体的工艺，其特征在于，为了提高溶胀率，通过加入非交联单体及其随后的聚合和/或物理作用，对所获得的部分交联聚合体颗粒的表层进行结构分解。