Reactions of trimethylstannide and trimethylsiliconide anions with aromatic and heteroaromatic substrates
作者:Al Postigo、Santiago E. Vaillard、Roberto A. Rossi
DOI:10.1002/poc.570
日期:2002.12
irradiation, the SRN1 mechanism operates concurrently with the formation of the hypervalent tin species. Me3Si− ions, on the other hand, react with PhX (X = Cl, Br, I) to yield the ipso substitution product, presumably through the intermediacy of a hypervalent silicon species. PhF affords, upon reaction with Me3Si− ions, o- and p-fluorotrimethylsilylbenzenes together with the ipso substitution product PhSiMe3
并行研究是对我的反应进行3的Sn -和Me 3硅-朝向在六甲基磷酰胺(HMPA)作为溶剂的芳族和杂芳族基片的离子。据发现,我3硅-离子是更具反应性的,并且因此选择性较低比我3的Sn -离子。在HMPA,披和PhBr与我反应3的Sn -通过HME路径离子。PhCl也通过HME反应发生反应,但是在光刺激下,S RN 1机制与HME过程竞争。与PHF作为底物中,Me 3 Sn的-离子可能通过高价锡物种提供了(4-氟苯基)三甲基锡烷。在辐射下,S RN 1机制与高价锡物种的形成同时进行。我3硅-离子,在另一方面,与PHX反应(X =氯,溴,I),得到本位取代产物,推测是通过一个高价硅物种的中间性。PHF得到,在反应时与我3硅-离子,ö -和p与一起-fluorotrimethylsilylbenzenes本位取代产物PhSiMe 3。一种新的类型的亲核取代机理发生与我3硅-在与芳族和杂芳族底物反应