2-Methyl-5,6-epoxy-1,3-dioxepan | 58124-70-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二氧环庚烷
• 英文名称: 2-Methyl-5,6-epoxy-1,3-dioxepan
• 英文别名: 4-Methyl-3,5,8-trioxabicyclo[5.1.0]octane
• CAS: 58124-70-2
• 化学式: C₆H₁₀O₃
• 分子量: 130.144
• InChiKey: QRQQOFQPKZFJJM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  31
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  2-methyl-4,7-dihydro-1,3-dioxepine 在 间氯过氧苯甲酸 作用下， 以 二氯甲烷 为溶剂， 生成 2-Methyl-5,6-epoxy-1,3-dioxepan
  参考文献：
  名称：

  Aqueous Developable and CO2‐Sourced Chemical Amplification Photoresist with High Performance

  摘要：

  Seeking high‐performance photoresist is an important item for semiconductor industry due to the continuous miniaturization and intelligentization of integrated circuits. Polymer resin containing carbonate group has many desirable properties, such as high transmittance, acid sensitivity and chemical formulation, thus serving as potential photoresist material. In this work, a series of aqueous developable CO2‐sourced polycarbonate (CO2‐PC) were produced via alternating copolymerization of CO2 and epoxides bearing acid‐cleavable cyclic acetal groups in the presence of tetranuclear organoborane catalyst. The produced CO2‐PCs were investigated as chemical amplification resists in deep ultraviolet (DUV) lithography. Under the catalysis of photoacid, the acetal (ketal) groups in CO2‐PC were hydrolysed into two equivalents of hydroxyl groups, which changes the exposed areas from hydrophobicity to hydrophilicity, thus enabling the exposed regions to be developed in water. Through normalized remaining thickness analysis, the optimal CO2‐derived resist achieved a remarkable sensitivity of 1.9 mJ/cm2, a contrast of 7.9, a favorable resolution (750 nm, half pitch), and etching resistance (38% higher than poly(tert‐butyl acrylate)). Such performances outperforming commercial KrF and ArF chemical amplification resists (i.e., polyhydroxystyrene‐derived and polymethacrylate‐based resists), which endows broad application prospects in the field of DUV (248 nm and 193 nm) and extreme ultraviolet (EUV) lithography and nanomanufacturing.

  DOI：

  10.1002/anie.202401850

文献信息

• INSECTICIDAL BIS(SUBSTITUTED PHENYL)-1-{[4-(SATURATED HETEROCYCLYL-SUBSTITUTED)PHENYLMETHYL]- (4-PIPERIDYL)}METHANE DERIVATIVES
  申请人：Lyga John W.

  公开号：US20090082203A1

  公开（公告）日：2009-03-26

  It has now been found that certain novel bis(substituted phenyl)-1 [4-(saturated heterocyclyl-substituted)phenyl-methyl](4-piperidyl)}methane derivatives have provided unexpected insecticidal activity. These compounds are represented by formula (I); where R through R 15 , m, n, s, A, B, D and W are defined herein. In addition, compositions comprising an insecticidally effective amount of at least one compound of formula (I), and optionally, an effective amount of at least one of a second compound, with at least one insecticidally compatible carrier are also disclosed; along with methods of controlling insects comprising applying said compositions to a locus where insects are present or are expected to be present.

  现在已经发现，某些新型的双（取代苯基）-1 [4-（饱和杂环取代）苯基甲基](4-哌啶基)}甲烷衍生物提供了意想不到的杀虫活性。这些化合物由式（I）表示; 其中R到R15，m，n，s，A，B，D和W在此定义。此外，本文还披露了包含式（I）中至少一种化合物的杀虫有效量和可选地至少一种第二化合物的有效量的组合物，其中至少包含一种杀虫剂兼容载体; 以及控制昆虫的方法，包括将所述组合物应用于昆虫存在或预计存在的地点。
• SOULIER J.; FARINES M.; BONAFOS-BASTOUILL A.; LAGUERRE A., BULL. SOC. CHIM. FR. <BSCF-AS>, 1975, NO 7-8, PART. 2, 1763-1766
  作者：SOULIER J.、 FARINES M.、 BONAFOS-BASTOUILL A.、 LAGUERRE A.

  DOI：——

  日期：——
• US4009128A
  申请人：——

  公开号：US4009128A

  公开（公告）日：1977-02-22
• US4047963A
  申请人：——

  公开号：US4047963A

  公开（公告）日：1977-09-13