2,4-diaminoresorcinol | 13066-96-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 2,4-diaminoresorcinol
• 英文别名: diaminoresorcinol；2,4-diamino-resorcinol；2,4-Diamino-resorcin；2.4-Diamino-1.3-dioxy-benzol；2.4-Diamino-resorcin；2,4-diaminobenzene-1,3-diol
• CAS: 13066-96-1
• 化学式: C₆H₈N₂O₂
• mdl: MFCD19203536
• 分子量: 140.142
• InChiKey: RWAOPZVGICHCOI-UHFFFAOYSA-N

物化性质

• 沸点：
  352.4±42.0 °C(Predicted)
• 密度：
  1.542±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -0.2
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  92.5
• 氢给体数：
  4
• 氢受体数：
  4

安全信息

• 海关编码：
  2922299090

反应信息

• 作为反应物：
  描述：

  十一烷酰氯 、 2,4-diaminoresorcinol 以 吡啶 为溶剂， 生成
  参考文献：
  名称：

  新的介晶化合物：N,N'-Dialkanoyl-2,4-bis(alkanoyloxy)-1,3-benzodiaamines

  摘要：

  合成了一系列N,N'-二烷酰基-2,4-双(烷酰氧基)-1,3-苯二胺。庚酰基到十六酰基衍生物中出现的高温相是粘性的，并转化为各向同性液体，焓变为 20 kJ mol-1 或更小。它们的 X 射线衍射图是六方无序柱状相的特征。在中间相区域测得的宽线质子 NMR 谱的二阶矩在辛酰基衍生物的情况下为 0.8 至 0.9 G2，在十四酰基衍生物的情况下为 0.04 G2，表明它们之间的运动行为差异较大半圆盘状分子。

  DOI：

  10.1246/bcsj.61.3083
• 作为产物：
  描述：

  2，4-二亚硝基间苯二酚 在 tin(ll) chloride 作用下， 以 盐酸 为溶剂， 生成 2,4-diaminoresorcinol
  参考文献：
  名称：

  新的介晶化合物：N,N'-Dialkanoyl-2,4-bis(alkanoyloxy)-1,3-benzodiaamines

  摘要：

  合成了一系列N,N'-二烷酰基-2,4-双(烷酰氧基)-1,3-苯二胺。庚酰基到十六酰基衍生物中出现的高温相是粘性的，并转化为各向同性液体，焓变为 20 kJ mol-1 或更小。它们的 X 射线衍射图是六方无序柱状相的特征。在中间相区域测得的宽线质子 NMR 谱的二阶矩在辛酰基衍生物的情况下为 0.8 至 0.9 G2，在十四酰基衍生物的情况下为 0.04 G2，表明它们之间的运动行为差异较大半圆盘状分子。

  DOI：

  10.1246/bcsj.61.3083

文献信息

• RESIN COMPOSITION
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20190241716A1

  公开（公告）日：2019-08-08

  The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate. The resin composition includes: (a) an alkali-soluble resin and (b1) an amido-phenol compound containing a phenolic hydroxyl group in which a monovalent group as represented by the undermentioned general formula (1) is located at the ortho position and/or (b2) an aromatic amido acid compound containing a carboxy group in which a monovalent group as represented by the undermentioned general formula (2) is located at the ortho position: wherein in general formula (1), X is a monovalent organic group having an alkyl group that contains 2 to 20 carbon atoms and bonds directly to the carbonyl carbon in general formula (1) or a monovalent organic group that has —(YO) n —; and in general formula (2), U is a monovalent organic group that has an alkyl group containing 2 to 20 carbon atoms and bonding directly to the amide nitrogen in general formula (2) or a monovalent organic group that has —(YO) n —; wherein Y is an alkylene group containing 1 to 10 carbon atoms and n is an integer of 1 to 20.

  本发明提供了一种树脂组合物，具有高灵敏度，并用于生产具有低吸水率的固化膜。该树脂组合物包括：(a)可溶于碱的树脂和(b1)含有酚羟基的酰胺酚化合物，其中酚羟基化合物中的单价基在邻位上，和/或(b2)含有羧基的芳香酰胺酸化合物，其中羧基化合物中的单价基在邻位上，其通式如下所示：在通式(1)中，X是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(1)中的羰基碳，或具有—(YO)n—的单价有机基；在通式(2)中，U是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(2)中的酰胺氮，或具有—(YO)n—的单价有机基；其中Y是含有1到10个碳原子的烷基，n是1到20的整数。
• Cleaving arylethers
  申请人：The Dow Chemical Company

  公开号：US05463129A1

  公开（公告）日：1995-10-31

  The present invention relates to a method of cleaving arylethers such as arylethers represented by the formula: ##STR1## wherein R is hydrogen, C.sub.1 -C.sub.6 alkyl, cycloalkyl, phenyl, substituted phenyl or CH.dbd.CH.sub.2 ; each A is independently NO.sub.2, hydroxy, halo, or methoxy; n is an integer from 0 to 5; and x is 1 or 2, comprising contacting the arylether with an amide hydrohalide salt under conditions sufficient to cleave the ether group(s) of the arylether and form a phenol or substituted phenol. The present invention also relates to a method of preparing 4,6-diaminoresorcinol, which is a monomer used for making polybenzoxazoles (PBO).

  本发明涉及一种裂解芳基醚的方法，如由以下式表示的芳基醚：##STR1## 其中R为氢，C.sub.1-C.sub.6烷基，环烷基，苯基，取代苯基或CH.dbd.CH.sub.2;每个A独立地为NO.sub.2，羟基，卤素或甲氧基; n为0至5的整数; x为1或2，包括将芳基醚与酰胺羟卤化物盐接触，条件足以裂解芳基醚的乙醚基，并形成苯酚或取代苯酚。本发明还涉及一种制备4,6-二氨基间苯二酚的方法，该物质是用于制备聚苯并咪唑（PBO）的单体。
• Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
  申请人：Nippon Kayaku Kabushiki Kaisha

  公开号：US20200392079A1

  公开（公告）日：2020-12-17

  This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R 1 , R 2 , R 3 , R 5 and R 6 represent a hydroxy group or an alkoxy group; the R 4 's independently represent an organic group containing a thioether bond; R 7 and R 9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R 8 represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion.

  这种化合物具有优异的溶剂溶解性和与树脂的兼容性，可以通过受到活性能量辐射而高效地产生碱基和自由基。该化合物由公式（1）表示，其中在公式（1）中，R1、R2、R3、R5和R6代表羟基或烷氧基；R4分别表示含硫醚键的有机基团；R7和R9分别代表氢原子或1至4个碳的烷基基团；R8代表烷基或芳基；X代表氧原子或硫原子。一种光聚合引发剂可以包括上述新化合物；一种光敏树脂组合物可以包括上述光聚合引发剂，从中可以得到高灵敏度且无金属腐蚀的固化产物。
• NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
  申请人：TOKYO UNIVERSITY OF SCIENCE FOUNDATION

  公开号：US20180370908A1

  公开（公告）日：2018-12-27

  The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R 1 to R 6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).

  本发明的目的是提供一种新的化合物，该化合物可以在受到活性能量射线照射时产生碱和自由基；一种包含该新化合物的光聚合引发剂；以及一种含有光聚合引发剂的光敏树脂组合物，该组合物具有高灵敏度和良好的储存稳定性，并且可以形成不具有金属腐蚀性的固化物品。该新化合物由式（1）表示：（其中，R1至R6独立地表示氢原子、羟基、烷氧基、除上述取代基外的有机基团等；X表示从含有环结构的饱和碳氢化合物中去除n个氢原子后的结构残基；n表示1至6的整数）。
• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Katayama Mami

  公开号：US20110086311A1

  公开（公告）日：2011-04-14

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

  一种光敏树脂组合物，具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点，其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂，以及一种聚合物前体，该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。