METHOD FOR PRODUCING 2,6-NAPHTHALENE DICARBOXYLIC ACID
申请人:UENO FINE CHEMICALS INDUSTRY, LTD.
公开号:US20190127310A1
公开(公告)日:2019-05-02
An object of the present invention is to provide a method for producing high-purity 2,6-NDA having a small alkali metal content. The present invention relates to a method for producing a high-purity 2,6-naphthalene dicarboxylic acid, comprising a purification step of washing a crude 2,6-naphthalene dicarboxylic acid having a specific surface area of 2 m
2
/g or more in the presence of an aqueous medium under a temperature condition of 90° C. or more and less than 200° C.
TRIMETHYLENE-2,6-NAPTHALENEDICARBOXYLATE (CO)POLYMER FILM, QUATERNARY PHOSPHONIUM SULFONATE COPOLYMER AND COMPOSITIONS THEREOF
申请人:TEIJIN LIMITED
公开号:EP1146068A1
公开(公告)日:2001-10-17
An aromatic polyester film, which comprises an aromatic polyester comprising 2,6-naphthalenedicarboxylic acid as the main dicarboxylic acid component and 1,3-propanediol as the main diol component and having a density of at least 1.310 g/cm3. A laminated film comprising another polyester layer can be formed from this aromatic polyester film. An aromatic polyester containing a small amount of a sulfonic acid phosphonium salt used as one of the aromatic polyesters forming this laminated film is excellent in electrostatic casting properties and resistance to the contamination of an electrostatic wire, and an aromatic polyester containing an inorganic anti-fungus agent is used for antifungal application.
Method for producing 2,6-naphthalene dicarboxylic acid
申请人:UENO FINE CHEMICALS INDUSTRY, LTD.
公开号:US10544084B2
公开(公告)日:2020-01-28
An object of the present invention is to provide a method for producing high-purity 2,6-NDA having a small alkali metal content. The present invention relates to a method for producing a high-purity 2,6-naphthalene dicarboxylic acid, comprising a purification step of washing a crude 2,6-naphthalene dicarboxylic acid having a specific surface area of 2 m2/g or more in the presence of an aqueous medium under a temperature condition of 90° C. or more and less than 200° C.