Fluoren-9-yl-vinyl-ether | 23189-81-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 芴
• 英文名称: Fluoren-9-yl-vinyl-ether
• 英文别名: 9-ethenoxy-9H-fluorene
• CAS: 23189-81-3
• 化学式: C₁₅H₁₂O
• 分子量: 208.26
• InChiKey: GNKNGSPEQAZSPL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20110294070A1

  公开（公告）日：2011-12-01

  A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

  一种聚合物是由一种具有酸敏感基团的羟基苯甲酸甲酯单体合成得到的。该聚合物作为基础树脂的正性光阻组合物具有极高的曝光前后碱溶解速率对比度、高分辨率、曝光后图案的良好轮廓和极小的线边粗糙度、缓慢的酸扩散速率和良好的蚀刻抗性。
• METAL COMPLEXES
  申请人：Stoessel Philipp

  公开号：US20130112921A1

  公开（公告）日：2013-05-09

  The present invention relates to metal complexes which contain polymerisable groups and to the polymers obtained using these metal complexes and to electronic devices, in particular organic electroluminescent devices, comprising these polymers. The metal complexes are compounds of the formula (1), containing a moiety M(L)n of the formula (2) or formula (3).

  本发明涉及含有可聚合基团的金属配合物，以及使用这些金属配合物得到的聚合物和电子器件，特别是包含这些聚合物的有机电致发光器件。这些金属配合物是式（1）的化合物，其中包含式（2）或式（3）的基团M（L）n。
• VERBINDUNGEN FÜR ORGANISCHE ELEKTROLUMINESZENZVORRICHTUNGEN
  申请人：Merck Patent GmbH

  公开号：EP2732479B1

  公开（公告）日：2019-09-11
• Positive resist composition and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20090202940A1

  公开（公告）日：2009-08-13

  The present invention provides a polymer, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance, suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition; a positive resist composition using the polymer; and a patterning process. The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1).
• STAT3 LIGANDS AND THERAPEUTIC USES THEREOF
  申请人：Wang Shaomeng

  公开号：US20110319362A1

  公开（公告）日：2011-12-29

  Inhibitors of STAT3 are disclosed. Methods of using the STAT3 inhibitors in the treatment of diseases and conditions wherein inhibition of STAT3 provides a benefit, like cancers, also are disclosed.