The complexes [Ni(SePiPr2)2N}2] (1), [Ni(Se2PiPr2)2] (2), and [Co(Se2PiPr2)2] (4) were synthesised and the X-ray single crystal structures of (1) and (2) were determined. Thin films of nickel selenide, cobalt selenide and cobalt phosphide have been deposited by the chemical vapour deposition method using imidodiselenophosphinato-nickel(II) (1), -cobalt(II) [Co(SePiPr2)2N}2] (3), diselenophosphinato-nickel(II) (2), -cobalt(II) (4) and diselenocarbamato-nickel(II) [Ni(Se2CNEt2)2] (5), and -cobalt(III) [Co(Se2CNEt2)3] (6) precursors.
合成了配合物 [Ni(SePiPr2)2N}2] (1)、[Ni(Se2PiPr2)2] (2) 和 [Co(Se2PiPr2)2] (4),并确定了 (1) 和 (2) 的 X 射线单晶结构。通过
化学气相沉积法,利用
咪唑二
硒磷酸镍(II) (1)、-
钴(II) [Co(SePiPr2)2N}2] (3)、二
硒磷酸镍(II) (2)、-
钴(II) (4) 和二
硒氨基
镍(II) [Ni(Se2CNEt2)2] (5) 以及 -
钴(III) [Co(Se2CNEt2)3] (6) 前驱体沉积了
镍硒化物、
钴硒化物和
钴磷化物的薄膜。