Tertiary amine and quaternary ammonium compounds of Formula I and/or Formula II are provided. The present technology also provides compositions that include one or more of the compounds that may be useful for electronics processing (e.g., semiconductor processing composition), cleaning, stripping, degreasing, or a combination of two or more thereof. The compounds of Formula I and/or Formula II may be useful as a low toxicity substitute for tetramethylammonium hydroxide.
提供了式I和/或式II的三级胺和季
铵化合物。本技术还提供了包括这些化合物中的一个或多个的组合物,可能对电子加工(例如,半导体加工组合物)、清洁、剥离、脱脂或两者以上的组合物有用。式I和/或式II的化合物可能作为
四甲基铵羟化物的低毒性替代品而有用。