1,1,1-tris(4-hydroxy-3,5-dimethylphenyl)ethane | 123222-57-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 1,1,1-tris(4-hydroxy-3,5-dimethylphenyl)ethane
• 英文别名: 1,1,1-tris(3,5-dimethyl-4-hydroxyphenyl)-ethane；4-[1,1-Bis(4-hydroxy-3,5-dimethylphenyl)ethyl]-2,6-dimethylphenol
• CAS: 123222-57-1
• 化学式: C₂₆H₃₀O₃
• 分子量: 390.522
• InChiKey: CUAWUNQAIYJWQT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7
• 重原子数：
  29
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.31
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  2,6-二甲基苯酚 、 4-羟基-3,5-二甲基苯乙酮 在 盐酸 、 sodium methyl mercaptan 作用下， 以 甲醇 为溶剂， 反应 17.0h， 以16%的产率得到1,1,1-tris(4-hydroxy-3,5-dimethylphenyl)ethane
  参考文献：
  名称：

  [EN] CRYSTAL OF 1,1,1-TRIS(4-HYDROXY-3,5-DIMETHYLPHENYL)ETHANE AND PRODUCTION METHOD THEREFOR
  [FR] CRISTAL DE 1,1,1-TRIS(4-HYDROXY-3,5-DIMÉTHYLPHÉNYL)ÉTHANE ET SON PROCÉDÉ DE PRODUCTION
  [JA] １，１，１－トリス（４－ヒドロキシ－３，５－ジメチルフェニル）エタンの結晶体及びその製造方法

  摘要：

  取扱性が良好な１，１，１－トリス（４－ヒドロキシ－３，５－ジメチルフェニル）エタンの結晶体及びその製造方法を提供することを課題とする。解決手段として、示差走査熱量分析による吸熱最大温度が１９５～２２５℃の範囲である、１，１，１－トリス（４－ヒドロキシ－３，５－ジメチルフェニル）エタンの結晶体を提供する。

  公开号：

  WO2022138178A1

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• POLYCARBONATE RESIN COMPOSITION AND FORMED PRODUCT THEREOF
  申请人：Monden Toshiki

  公开号：US20110245388A1

  公开（公告）日：2011-10-06

  In a polycarbonate resin composition containing a polycarbonate resin and a polycarbosilane compound, the use of the polycarbosilane compound modifies the surface properties of the polycarbonate resin composition without adversely affecting the intrinsic characteristics of the polycarbonate resin, such as transparency, heat resistance, and mechanical properties, e.g., impact resistance. A polycarbonate resin composition containing 100 parts by mass of a polycarbonate resin, 0.001 to 1 part by mass of a metal salt compound, and 0.005 to 5 parts by mass of a polycarbosilane compound has significantly improved flame resistance and high transparency and causes markedly reduced outgassing and mold fouling, without losing impact resistance and heat resistance.

  在含有聚碳酸酯树脂和聚碳硅烷化合物的聚碳酸酯树脂组合物中，使用聚碳硅烷化合物可以改变聚碳酸酯树脂组合物的表面特性，而不会对聚碳酸酯树脂的固有特性产生不利影响，如透明度、耐热性和机械性能（例如冲击强度）。含有100质量部聚碳酸酯树脂、0.001至1质量部金属盐化合物和0.005至5质量部聚碳硅烷化合物的聚碳酸酯树脂组合物具有显著提高的阻燃性和高透明度，显著减少气体排放和模具污染，同时不会损失冲击强度和耐热性。
• BISBENZOXAZINONE COMPOUND
  申请人：Ibusuki Shun

  公开号：US20120252941A1

  公开（公告）日：2012-10-04

  It is an object of the present invention to provide a bisbenzoxazinone compound which does not substantially contain an alkali metal salt, has high purity and provides a resin composition having excellent resistance to hydrolysis when it is contained in a resin, a production method thereof, and a resin composition comprising the compound. The present invention is a bisbenzoxazinone compound represented by the following formula (4): (R 1 and R 2 are each independently a hydrogen atom, hydroxyl group, alkyl group having 1 to 3 carbon atoms, or the like), and has (i) a purity of 98% or more, (ii) a content of a compound represented by the following formula (7) of less than 0.15 wt %: (iii) a maximum peak in the measurement of the light reflectance at a visible range of its powder at 380 to 480 nm and a maximum light reflectance of 100 to 120%, (iv) a metal sodium content of less than 50 ppm and (v) a YI value of −10 to 10.

  本发明的目的是提供一种双苯并噁唑酮化合物，其基本不含碱金属盐，具有高纯度并在树脂中含有时提供具有优异的耐水解性的树脂组合物，以及其生产方法和包含该化合物的树脂组合物。本发明是由以下公式（4）表示的双苯并噁唑酮化合物：（其中R1和R2各自独立地表示氢原子，羟基，具有1至3个碳原子的烷基或类似物），具有（i）98％或更高的纯度，（ii）少于0.15重量％的以下公式（7）所表示的化合物含量，（iii）在可见光范围内在380至480 nm处的粉末的光反射测量中具有最大峰值，并具有100至120％的最大光反射率，（iv）钠金属含量低于50 ppm和（v）YI值为-10至10。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280621A1

  公开（公告）日：2016-09-29

  The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R 1 and R 6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R 2 and R 5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R 3 and R 4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R 3 and R 4 may be bonded to each other to form a ring.

  该组合物包含一种碱溶性树脂和一种由下列通式（I）表示的交联剂。在该式中，R1和R6各自独立地表示氢原子或具有5个或更少碳原子的碳氢基团；R2和R5各自独立地表示烷基、环烷基、芳基或酰基；R3和R4各自独立地表示氢原子或具有2个或更多碳原子的有机基团，且R3和R4可以结合形成环。
• PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
  申请人：KODAMA Kunihiko

  公开号：US20080138742A1

  公开（公告）日：2008-06-12

  The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.

  本发明涉及一种在阳离子部分具有多环碳氢结构的芳基磺酸盐化合物。