lithocholic acid | 516-73-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 类固醇和类固醇衍生物
• 英文名称: lithocholic acid
• 英文别名: NSC 683770；Lithocholsaeure；Zithocholsaeure；Cholan-24-oic acid, 3-hydroxy-, (3alpha,5beta)-；4-(3-hydroxy-10,13-dimethyl-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1H-cyclopenta[a]phenanthren-17-yl)pentanoic acid
• CAS: 516-73-4
• 化学式: C₂₄H₄₀O₃
• 分子量: 376.58
• InChiKey: SMEROWZSTRWXGI-UHFFFAOYSA-N

物化性质

• 沸点：
  511.0±23.0 °C(Predicted)
• 密度：
  1.073±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  6.3
• 重原子数：
  27
• 可旋转键数：
  4
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.96
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  lithocholic acid 在 三乙胺 、 N,N'-羰基二咪唑 作用下， 以 氯仿 、 N,N-二甲基甲酰胺 为溶剂， 反应 30.5h， 生成
  参考文献：
  名称：

  塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

  摘要：

  提供旨在制造具有良好CD均一性（CDU）的感光树脂图案的盐类、酸发生剂和感光树脂组合物。采用式（I）表示的盐类、酸发生剂和含有该酸发生剂的感光树脂组合物。【式中，Q1和Q2分别为氟原子或全氟烷基；R1和R2分别为氢原子、氟原子或全氟烷基；z为0~6的整数；X1为*−CO−O−、*−O−CO−、*−O−CO−O−等；L1、L2和L3分别为单键或脂肪二烯基，其中的−CH2−基可被−O−或−CO−取代；A1表示上述的二价环，该环可具有烷基或羟基；R3和R4分别为氢原子或饱和碳氢基；R5为具有取代基的环状碳氢基；Z+表示有机阳离子。】【选择图】无

  公开号：

  JP2019214551A

文献信息

• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：NISHI Tsunehiro

  公开号：US20100062374A1

  公开（公告）日：2010-03-11

  A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R 1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

  一种正性光刻胶组合物包括（A）在酸的作用下在碱性显影剂中变得可溶的树脂组分和（B）酸发生剂。树脂（A）是一种聚合物，包含由式（1）表示的非离去羟基的重复单元，其中R1为H、甲基或三氟甲基，X为单键或亚甲基，m为1或2，并且羟基连接到次级碳原子。当通过光刻工艺处理时，该组合物在分辨率方面得到改善。
• ACETAL COMPOUNDS AND THEIR PREPARATION, POLYMERS, RESIST COMPOSITIONS AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20100136485A1

  公开（公告）日：2010-06-03

  An acetal compound of formula (1) is provided wherein R 1 is H, methyl or trifluoromethyl, R 2 is a monovalent C 1 -C 10 hydrocarbon group, R 3 and R 4 are H or a monovalent C 1 -C 10 hydrocarbon group, R 2 and R 3 may together form an aliphatic hydrocarbon ring, and X 1 is a single bond or a divalent C 1 -C 4 hydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.

  提供了一个式为（1）的缩醛化合物，其中R1为H、甲基或三氟甲基，R2为一价的C1-C10烃基，R3和R4为H或一价的C1-C10烃基，R2和R3可能共同形成脂肪烃环，X1为单键或二价的C1-C4烃基。由这种缩醛化合物衍生的重复单位构成的聚合物被用作基础树脂，制备耐光刻蚀性能高的光刻胶组合物，特别适用于微细图案技术处理，尤其是ArF光刻技术。
• Ester compounds and their preparation, polymers, resist compositions and patterning process
  申请人：Ohashi Masaki

  公开号：US20080008965A1

  公开（公告）日：2008-01-10

  Novel ester compounds having formulae (1) to (4) wherein A 1 is a polymerizable functional group having a carbon-carbon double bond, A 2 is oxygen, methylene or ethylene, R 1 is a monovalent hydrocarbon group, R 2 is H or a monovalent hydrocarbon group, any pair of R 1 and/or R 2 may form an aliphatic hydrocarbon ring, R 3 is a monovalent hydrocarbon group, and n is 0 to 6 are polymerizable into polymers. Resist compositions comprising the polymers as a base resin are thermally stable and sensitive to high-energy radiation, have excellent sensitivity and resolution, and lend themselves to micropatterning with electron beam or deep-UV.

  具有以下化学式（1）至（4）的新酯化合物，其中A1是具有碳-碳双键的可聚合官能团，A2是氧、亚甲基或乙烯基，R1是一价碳氢基团，R2是氢或一价碳氢基团，任意一对R1和/或R2可能形成脂肪烃环，R3是一价碳氢基团，n为0至6，可聚合成聚合物。作为基础树脂的聚合物组成物具有热稳定性，并对高能辐射敏感，具有出色的敏感度和分辨率，并适用于电子束或深紫外微图案化。
• Cholanic Acid Amides
  申请人：Schreiner Erwin Paul

  公开号：US20090258847A1

  公开（公告）日：2009-10-15

  4-(3-hydroxy-10,13-dimethyl-hexadecahydro-cyclopenta[a]phenanthren-17-yl)-pentanoic acid amides wherein the nitrogen of the amide group is substituted by a sulfonylaminocarbonyl-(C 1-4 )-alkyl group; and the use of such compounds as pharmaceuticals.

  4-(3-羟基-10,13-二甲基-十六烷基环戊-α-苯并芘-17-基)-戊酸酰胺，其中酰胺基的氮原子被磺酰氨基羰基-(C1-4)-烷基取代；以及将这些化合物用作药物的用途。
• Polymerizable compound, polymer, positive resist composition, and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20090297979A1

  公开（公告）日：2009-12-03

  The present invention provides; a polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist; a positive resist composition using the same; a patterning process; and a novel polymerizable compound to obtain a polymer like this. The present invention was accomplished by a polymer whose hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

  本发明提供了一种聚合物，适用于作为正向光刻胶组成的基础树脂，特别是化学放大正向光刻胶组成，具有更高的分辨率、更大的曝光容差、更小的稀密差异、更好的工艺适用性、曝光后更好的图案构形，以及比传统正向光刻胶更出色的蚀刻抗性；使用该聚合物的正向光刻胶组成；一种图案化工艺；以及一种新型的可聚合化合物，以获得类似的聚合物。本发明通过一种聚合物实现，其至少一个羧基的氢原子被下述通式（2）所表示的酸敏感基团所取代，使用该聚合物的正向光刻胶组成，一种图案化工艺，以及一种新型的可聚合化合物，以获得类似的聚合物。

表征谱图