cetrimonium lactate | 125094-06-6

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: cetrimonium lactate
• 英文别名: Hexadecyl(trimethyl)azanium;2-hydroxypropanoate
• CAS: 125094-06-6
• 化学式: C₃H₅O₃*C₁₉H₄₂N
• 分子量: 373.62
• InChiKey: DPXJRRNZAUKEHX-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  4.29
• 重原子数：
  26
• 可旋转键数：
  15
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.95
• 拓扑面积：
  60.4
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  十六烷基三甲基溴化铵 、 乳酸钠 在 甲醇 作用下， 反应 48.0h， 生成 cetrimonium lactate
  参考文献：
  名称：

  Dual active ionic liquids and organic salts for inhibition of microbially influenced corrosion

  摘要：

  我们介绍了一系列新型化合物，这些化合物旨在对抗导致海洋环境中由微生物引起的钢材腐蚀的细菌生长。这些双重活性有机盐中的离子成分具有协同效应。

  DOI：

  10.1039/c2cc32375c

文献信息

• Detergent For Lithography And Method Of Forming Resist Pattern With The Same
  申请人：Sawada Yoshihiro

  公开号：US20090004608A1

  公开（公告）日：2009-01-01

  Conventional detergents for lithography which contain a surfactant as an active ingredient should have a reduced surfactant concentration because heightened surfactant concentrations result in dissolution of the resin component of a photoresist composition and hence in a dimensional change of a resist pattern. However, the conventional detergents have had a drawback that such a low concentration unavoidably reduces the ability to inhibit pattern falling and defect occurrence. A detergent for lithography is provided which is an aqueous solution containing (A) at least one member selected among nitrogenous cationic surfactants and nitrogenous ampholytic surfactants and (B) an anionic surfactant. This detergent retains a low surface tension even when it has a low concentration. It is effective in inhibiting pattern falling and defect occurrence. It can also inhibit resist patterns from fluctuating in dimension.
• US8367312B2
  申请人：——

  公开号：US8367312B2

  公开（公告）日：2013-02-05