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2-methoxynaphthalene-1-thiol | 14944-37-7

中文名称
——
中文别名
——
英文名称
2-methoxynaphthalene-1-thiol
英文别名
2-methoxy-naphthalene-1-thiol;Methyl-(1-mercapto-naphthyl-(2))-aether;2-Methoxy-naphthyl-(1)-mercaptan;2-Methoxy-naphthalin-1-thiol;1-Mercapto-naphthol-(2)-methylaether;2-Methoxy-1-mercapto-naphthalin
2-methoxynaphthalene-1-thiol化学式
CAS
14944-37-7
化学式
C11H10OS
mdl
——
分子量
190.266
InChiKey
JLAMBQUZKINLLL-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    65-68 °C
  • 沸点:
    332.9±25.0 °C(Predicted)
  • 密度:
    1.187±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    3.3
  • 重原子数:
    13
  • 可旋转键数:
    1
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.09
  • 拓扑面积:
    10.2
  • 氢给体数:
    1
  • 氢受体数:
    2

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20160145231A1
    公开(公告)日:2016-05-26
    A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
    描述了一种包含由通式(1)或(2)表示的化合物的光刻胶组合物,使用该组合物形成光刻胶图案的方法,用于该组合物的多酚化合物,以及可以由其衍生的醇化合物。
  • COMPOSITION, SYNTHESIS, AND USE OF NEW ARYLSULFONYL ISONITRILES
    申请人:DUQUESNE UNIVERSITY OF THE HOLY GHOST
    公开号:US20150239833A1
    公开(公告)日:2015-08-27
    This invention relates to novel isonitriles, including arylsulfonyl isonitriles, and methods for their synthesis. The isonitriles include a conjugated ring system. The structure is designed with the flexibility to have multiple substitution patterns. The isonitriles may be used in applications including, but not limited to, pharmaceutical compositions.
    这项发明涉及新型异腈,包括芳基磺酰异腈,以及它们的合成方法。异腈包括一个共轭环系统。该结构设计具有多种取代模式的灵活性。异腈可用于包括但不限于药物组合物在内的应用中。
  • Alkyl Sulfinates: Formal Nucleophiles for Synthesizing TosMIC Analogs
    作者:J. Armando Lujan-Montelongo、Angel Ojeda Estevez、Fraser F. Fleming
    DOI:10.1002/ejoc.201403615
    日期:2015.3
    Alkyl sulfinates function as formal nucleophiles in Mannich-type reactions to give sulfonyl formamides, which are readily dehydrated to the corresponding sulfonylmethyl isonitriles. The efficient, two-step synthesis provides a general route to sulfonylmethyl isonitriles from readily available methyl sulfinates or thiols. Mechanistic analysis reveals that the unusual nucleophlicity of the alkyl sulfinates
    烷基亚磺酸盐在曼尼希型反应中用作正式的亲核试剂,生成磺酰甲酰胺,后者很容易脱水成相应的磺酰甲基异腈。高效的两步合成为从容易获得的亚磺酸甲酯或硫醇制备磺酰甲基异腈提供了一条通用途径。机理分析表明,烷基亚磺酸盐的异常亲核性源于亚磺酸的原位释放。
  • Metal Thietane Compound, Polymerizable Composition Containing the Compound, Resin and Use of the Resin
    申请人:Murakami Masakazu
    公开号:US20130018169A1
    公开(公告)日:2013-01-17
    Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.
    含有至少一种由通式(110)、(201)或(120)表示的金属噻吩化合物的聚合物组合物,其中所述的通式如下:其中所识别的基团和n、p、q和r已被定义。
  • COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD
    申请人:MITSUBISHI GAS CHEMICAL COMPANY, INC.
    公开号:US20150376202A1
    公开(公告)日:2015-12-31
    The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R 1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R 2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.)
    本发明的光刻下层膜材料包含具有以下一般式(1)所代表结构的化合物。(在式(1)中,每个X独立地代表氧原子或硫原子,R1代表一个单键或具有1至30个碳原子的2n-价碳氢基团,碳氢基团可能具有一个环状碳氢基团,一个双键,一个杂原子或具有6至30个碳原子的芳香族基团,R2代表具有1至10个碳原子的直链、支链或环状烷基基团,具有6至10个碳原子的芳基基团,具有2至10个碳原子的烯基基团,或一个羟基,m是0到3的整数,n是1到4的整数,p是0或1,q是1到100的整数。)
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