Direct reductive amination using triethylsilane and catalytic bismuth(III) chloride
作者:Takehiko Matsumura、Masahisa Nakada
DOI:10.1016/j.tetlet.2014.01.132
日期:2014.3
Direct reductive amination (DRA) using triethylsilane (TESH) and catalytic bismuth(III) chloride (BiCl3) is described for the first time. The use of TESH and BiCl3 provides easy handling, low cost, non-toxicity, and a mild Lewis acid activity, thereby meeting the demand for green and sustainable chemistry. The developed DRA is highly chemoselective and applicable to less-basic amines. The experimental