作者:Michael P. Clarke、Iain M.T. Davidson
DOI:10.1016/0022-328x(91)86378-4
日期:1991.5
flow reactor, the silylene intermediates SiMeCl and SiCl2 are shown to be formed during the Direct Synthesis. Two types of silylene intermediate are believed to be involved. Silylenoids are formed on the surface where they react with methyl chloride yielding methylchclorosilanes (SiMeCl gives Me2SiCl2, SiCl2 gives MeSiCl3) in accordance with the van den Berg mechanism. Free silylenes are released into
从间歇流反应器中的丁二烯捕集实验中,表明在直接合成过程中形成了甲硅烷基中间体SiMeCl和SiCl 2。据信涉及两种类型的甲硅烷基中间体。根据范德伯格机理,在与氯甲烷反应的表面上形成硅酮化合物,生成甲基氯硅烷(SiMeCl生成Me 2 SiCl 2,SiCl 2生成MeSiCl 3)。游离的甲硅烷基释放到气相中,在气相中它们可能被丁二烯截留,但不直接参与甲基氯硅烷的生产。将Me 3 SiH添加到氯甲烷中可促进自由基反应。主要产品是我3氯化硅。据信Me 3 SiCl是由有效的链序列产生的,该链序列主要在涉及清除表面结合氯的Me 3 Si·自由基的表面上进行。