Heterogeneous Palladium-Catalyzed Synthesis of Aromatic Ethers by Solvent-Free Dehydrogenative Aromatization: Mechanism, Scope, and Limitations Under Aerobic and Non-Aerobic Conditions
derivatives and alcohols, both non-aromatic precursors, aryl ethers could be synthesized in good yields and with good selectivities in the presence of a catalytic amount of Pd/C, in one step, without added solvent, in a reaction vessel open to air. For less reactive substrates, the addition of 1-octene in a closed system undernon-aerobicconditions improved the conversion. In addition, the catalyst could
Copper Catalyzed sp<sup>3</sup> C–H Etherification with Acyl Protected Phenols
作者:Tolani K. Salvador、Charles H. Arnett、Subrata Kundu、Nicholas G. Sapiezynski、Jeffery A. Bertke、Mahdi Raghibi Boroujeni、Timothy H. Warren
DOI:10.1021/jacs.6b09057
日期:2016.12.28
A variety of acyl protected phenols AcOAr participate in sp3 C-H etherification of substrates R-H to give alkyl aryl ethers R-OAr employing tBuOOtBu as oxidant with copper(I) β-diketiminato catalysts [CuI]. Although 1°, 2°, and 3° C-H bonds may be functionalized, selectivity studies reveal a preference for the construction of hindered, 3° C-OAr bonds. Mechanistic studies indicate that β-diketiminato
The acid-catalysed addition of phenols and acetic acid to alkenes
作者:D. T. Dalgleish、D. C. Nonhebel、P. L. Pauson
DOI:10.1039/j39710001174
日期:——
High yields of ethers are obtained from the title reaction using fluoroboric acid as catalyst. Competitive reactions between cyclohexene and oct-1-ene show remarkably small but solvent dependent selectivity. Addition of aceticacid to the same pair of alkenes is similarly unselective.
Photoacid generators, chemically amplified resist compositions, and patterning process
申请人:——
公开号:US20040229162A1
公开(公告)日:2004-11-18
Photoacid generators have formula (1) wherein R
1
and R
2
are alkyl, or R
1
and R
2
, taken together, may form a C
4
-C
6
ring structure with sulfur, R is hydrogen or alkyl, R′ is hydrogen, alkyl, alkoxyl or nitro, n is 1 to 6, and Y
−
is alkylsulfonate, arylsulfonate, bisalkylsulfonylimide or trisalkylsulfonylmethide. Chemically amplified resist compositions comprising the same have improved resolution, thermal stability, storage stability and minimized line edge roughness.
1