PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION
申请人:San-Apro Limited
公开号:EP2284165A1
公开(公告)日:2011-02-16
An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R1 is a group represented by formula (2); R2 and R3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X- represents a monovalent polyatomic anion; R4 to R6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by -S-, -O-, -SO-, -SO2-, or -CO-.
本发明的目的是提供一种锍盐,该锍盐对可见光、紫外线、电子束和 X 射线等活性能量射线具有足够的光敏性。本发明是一种由式(1)表示的锍盐。值得注意的是,R1 是式 (2) 所代表的基团;R2 和 R3 分别代表具有 6 至 30 个碳原子的芳基、具有 4 至 30 个碳原子的杂环烃基、具有 1 至 30 个碳原子的烷基、具有 2 至 30 个碳原子的烯基或具有 2 至 30 个碳原子的炔基;X- 代表一价多原子阴离子;R4 至 R6 分别代表烷基或类似物;k 代表 0 至 4 的整数;m 代表 0 至 3 的整数;n 代表 0 至 4 的整数;以及 A 代表由 -S-、-O-、-SO-、-SO2- 或 -CO- 所代表的基团。