申请人:Ito Takashi
公开号:US20090209674A1
公开(公告)日:2009-08-20
Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time.
The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below;
(wherein R
1
denotes an alkyl group having 1 to 5 carbon atoms, and R
2
denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond) in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
提供了一种用于立体光刻的树脂组合物,其在未固化状态下吸收的水分和湿气很少,即使在高湿度下也保持低的吸湿率,并具有高的固化敏感性,可以顺利生产出具有尺寸精度、机械性能和尺寸稳定性等优良性能的立体光刻产品,从而减少光照时间。该立体光刻用树脂组合物包括以下通式(I)所表示的环氧乙烷化合物;(其中R1表示1至5个碳原子的烷基,R2表示含有2至10个碳原子的烷基,可能含有醚键),其比例为3至60质量%,基于立体光刻用树脂组合物的总质量。