[EN] METHOD FOR COUPLING A FIRST AROMATIC COMPOUND TO A SECOND AROMATIC COMPOUND<br/>[FR] PROCÉDÉ DE COUPLAGE D'UN PREMIER COMPOSÉ AROMATIQUE À UN SECOND COMPOSÉ AROMATIQUE
申请人:DOW GLOBAL TECHNOLOGIES LLC
公开号:WO2015148931A1
公开(公告)日:2015-10-01
In one aspect, there is provided a method of coupling a first aromatic compound having a fluorosulfonate substituent to a second aromatic compound having a boron-containing substituent. In another aspect, there is provided a method of coupling a first aromatic compound having a hydroxyl substituent to a second aromatic compound having a boron-containing substituent in a one-pot reaction.
A method of coupling an aromatic compound having a two or more fluorosulfonate substituents to an alkyne is useful in the preparation of polyalkynyl-substituted arene compounds.
将具有两个或两个以上氟磺酸盐取代基的芳香族化合物与炔烃偶联的方法可用于制备多炔烃取代的炔烃化合物。
Method for coupling a first compound to a second compound
申请人:Dow Global Technologies LLC
公开号:US10125082B2
公开(公告)日:2018-11-13
The present disclosure describes a method of coupling a first compound to a second compound, the method comprising: providing the first compound having a fluorosulfonate substituent; providing the second compound comprising an alkene; and reacting the first compound and the second compound in a reaction mixture, the reaction mixture including a catalyst having at least one group 10 atom, the reaction mixture under conditions effective to couple the first compound to the second compound.
METHOD FOR COUPLING A FIRST AROMATIC COMPOUND TO A SECOND AROMATIC COMPOUND
申请人:Dow Global Technologies LLC
公开号:EP3122707A1
公开(公告)日:2017-02-01
METHOD OF FORMING POLYARYL POLYMERS AND POLYMERS FORMED THEREBY
申请人:DOW Global Technologies LLC
公开号:US20170051102A1
公开(公告)日:2017-02-23
In a method of forming a polyaryl polymer, a fluorosulfonate-containing monomer is coupled with itself or a boron-containing comonomer in the presence of a catalyst and a base. The resulting polymers can be used as precursors to electrically conducting polymers, and as components of resist or underlayer compositions for photolithography, among other applications.