Structural Characterization of Hydro‐, Chloro‐ and Fluoroorganylsilanes with Substituents of Varying Electron Withdrawing Character
作者:Mira Keßler、Sven Porath、Hans‐Georg Stammler、Berthold Hoge
DOI:10.1002/ejic.202001065
日期:2021.3.12
We report on the molecular structure of trimethylsilanes Si(CH3)3X in which the substituents X, namely (Z)‐pentafluoropropen‐1‐yl, trifluoropropyn‐1‐yl, pentafluoroethyl, trifluorovinyl, vinyl, propyn‐1‐yl, di‐ and trichloromethyl, display electron withdrawing effects of varying strength. The lengths of the bonds between the silicon and the carbon atoms of X correlate with the hybridization of the
我们报告了三甲基硅烷Si(CH 3)3 X的分子结构,其中的取代基X为(Z)-五氟丙烯-1-基,三氟丙炔-1-基,五氟乙基,三氟乙烯基,乙烯基,丙炔-1-基,二氯和三氯甲基,显示出不同强度的电子吸收效应。X的硅和碳原子之间的键的长度与各个轨道的杂化和X的空间需求相关,而不与电子吸收能力相关。在氯化取代基的情况下,分散效应似乎会缩短Si-C键。此外,还有一种从致冷剂2,3,3,3-四氟丙烯(HFO-1234yf)和n生成三氟丙炔-1-基锂的途径描述了丁基锂。四氟丙烯-1-基锂在-80°C时缓慢形成,但即使在此温度下,也会自发消除LiF。所形成的3,3,3-三氟丙炔的去质子化需要高于-60°C的温度,从而导致三氟丙炔-1-基锂在室温下相对稳定。