This invention relates to compositions of matter that include a polymerization stress reducing monomer, which may be one of the novel tetraoxaspiroalkanes disclosed herein, and an organosilicon monomer, such as a silorane. These matrix resin compositions may also include a photoinitiator, a photosensitizer, a reaction promoter, and other additives. The photopolymerizable compositions of this invention are useful for a variety of applications including use as dental matrix resin systems, such as restorative composites.
本发明涉及包括聚合应力减少单体的物质组合物,该单体可以是此处披露的新型四氧杂螺环烷之一,并且还包括一个有机
硅单体,例如
硅氧烷。这些基质
树脂组合物还可以包括光
引发剂、光敏剂、反应
促进剂和其他添加剂。本发明的光聚合组合物可用于各种应用,包括用作牙科基质
树脂系统,例如修复复合材料。