Radical Aromatic Trifluoromethylthiolation: Photoredox Catalysis vs. Base Mediation
作者:Denis Koziakov、Michal Majek、Axel Jacobi von Wangelin
DOI:10.1002/ejoc.201701339
日期:2017.12.8
Trifluoromethyl aryl sulfides (Ar-SCF3) constitute highly attractive building blocks due to their exceptional lipophilicity and chemical properties. Related protocols of radical aromatic trifluoro-methylthiolation of arenediazonium salts were developed that are based on the facile generation of intermediate arylradicals. Their reactions with commercial F3CS-SCF3 under very mild conditions afforded