聚乙二醇醚 | 31017-83-1

• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: 聚乙二醇醚
• 英文名称: 2,2'-[(Dodecylimino)bis(ethyleneoxy)]diethanol
• 英文别名: 2-[2-[dodecyl-[2-(2-hydroxyethoxy)ethyl]amino]ethoxy]ethanol
• CAS: 31017-83-1
• 化学式: C₂₀H₄₃NO₄
• 分子量: 361.6
• InChiKey: NUSMTFFYLONGGV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  25
• 可旋转键数：
  21
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  62.2
• 氢给体数：
  2
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  聚乙二醇醚 、 双氧水 生成 N,N-bis[2-(2-hydroxyethoxy)ethyl]dodecan-1-amine oxide
  参考文献：
  名称：

  WEDLER C.; HAAGE K.; HERBST M.; TISCHER H.; KNOPE E., ABH. AKAD. WISS. DDR. ABT. MATH., NATURWISS., TECHN.,(1986) N 1N, 589-594

  摘要：

  DOI：
• 作为产物：
  描述：

  十二烷基伯胺 、 2-氯乙氧基乙醇 生成 聚乙二醇醚
  参考文献：
  名称：

  WEDLER C.; HAAGE K.; HERBST M.; TISCHER H.; KNOPE E., ABH. AKAD. WISS. DDR. ABT. MATH., NATURWISS., TECHN.,(1986) N 1N, 589-594

  摘要：

  DOI：

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN
  申请人：FUJIFILM Corporation

  公开号：US20150132688A1

  公开（公告）日：2015-05-14

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种光致射线敏感或辐射敏感的树脂组合物，其中包括（P）具有（a）由特定公式表示的重复单元的树脂；使用该光致射线敏感或辐射敏感的树脂组合物形成的抗蚀膜；包括（i）使用该光致射线敏感或辐射敏感的树脂组合物形成膜的步骤，（ii）曝光膜的步骤，以及（iii）使用显影剂显影曝光的膜以形成图案的图案形成方法；一种制造电子设备的方法，包括图案形成方法；以及通过电子设备的制造方法制造的电子设备。
• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160018734A1

  公开（公告）日：2016-01-21

  There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.

  提供了一种图案形成方法，包括以下步骤：(a)使用电子束敏感或极紫外辐射敏感的树脂组合物在基板上形成薄膜的步骤，(b)使用含有至少一个由下式(I-1)到(I-5)中所示的重复单元表示的树脂(T)的顶层涂料组成的顶层涂料层的形成步骤，(c)使用电子束或极紫外辐射照射具有顶层涂料层的薄膜的步骤，以及(d)在照射后开发具有顶层涂料层的薄膜以形成图案的步骤。
• Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device
  申请人：FUJIFILM Corporation

  公开号：US10175578B2

  公开（公告）日：2019-01-08

  A pattern forming method includes coating an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form an actinic ray-sensitive or radiation-sensitive film, coating a composition for forming a protective film onto the actinic ray-sensitive or radiation-sensitive film to form a protective film, exposing the actinic ray-sensitive or radiation-sensitive film covered with the protective film, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the protective film contains a compound (A) including at least one group or bond selected from the group consisting of an ether bond, a thioether bond, a hydroxyl group, a thiol group, a carbonyl bond, and an ester bond, and a resin (X).

  一种图案形成方法包括将感光或感辐射树脂组合物涂布到基底上以形成感光或感辐射胶片，将用于形成保护膜的组合物涂布到感光或感辐射胶片上以形成保护膜，曝光覆盖有保护膜的感光或感辐射胶片、使用含有有机溶剂的显影剂对曝光的感光胶片或辐射敏感胶片进行显影，其中保护膜含有一种化合物 (A)，该化合物包括至少一个选自由醚键、硫醚键、羟基、硫醇基、羰基键和酯键组成的基团或键，以及一种树脂 (X)。
• Pattern forming method, resist pattern, and process for producing electronic device
  申请人：FUJIFILM Corporation

  公开号：US10578968B2

  公开（公告）日：2020-03-03

  The present invention has an object to provide a pattern forming method capable of providing good DOF and EL, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method. The pattern forming method of the present invention includes a step a of coating an active-light-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, a step b of coating a composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, a step c of exposing the resist film having the upper layer film formed thereon, and a step d of developing the exposed resist film using a developer to form a pattern, in which the active-light-sensitive or radiation-sensitive resin composition contains a hydrophobic resin.

  本发明的目的是提供一种能够提供良好的DOF和EL的图案形成方法、一种由该图案形成方法形成的抗蚀剂图案，以及一种制造电子设备的方法，包括该图案形成方法。本发明的图案形成方法包括步骤 a：在基板上涂布活性光敏或辐射敏感树脂组合物以形成抗蚀剂薄膜；步骤 b：在抗蚀剂薄膜上涂布用于形成上层薄膜的组合物以在抗蚀剂薄膜上形成上层薄膜；步骤 c：曝光形成有上层薄膜的抗蚀剂薄膜；步骤 d：使用显影剂显影曝光的抗蚀剂薄膜以形成图案，其中活性光敏或辐射敏感树脂组合物包含疏水性树脂。
• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing
  申请人：FUJIFILM Corporation

  公开号：US10928727B2

  公开（公告）日：2021-02-23

  According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

  根据本发明，提供了一种光敏或辐射敏感树脂组合物，其中包括在酸的作用下在碱显影剂中的溶解速率会降低的化合物（A）、疏水性树脂（B）和具有芳香环的树脂（C），以及使用该组合物的薄膜、掩膜坯、图案形成方法和电子设备制造方法。