2,4-Bis-hydroxymethyl-3-methyl-phenol | 64032-86-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 2,4-Bis-hydroxymethyl-3-methyl-phenol
• 英文别名: 2,4-Bis(hydroxymethyl)-3-methylphenol
• CAS: 64032-86-6
• 化学式: C₉H₁₂O₃
• 分子量: 168.192
• InChiKey: HTSBTVKKPNTQFX-UHFFFAOYSA-N

物化性质

• 熔点：
  132 °C
• 沸点：
  387.8±37.0 °C(Predicted)
• 密度：
  1.276±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  2-羟基-6-甲基苯甲醛 在 氢氧化钾 、 lithium aluminium tetrahydride 、 乙醚 作用下， 生成 2,4-Bis-hydroxymethyl-3-methyl-phenol
  参考文献：
  名称：

  Reese, Chemische Berichte, 1953, vol. 86, p. 979,984

  摘要：

  DOI：

文献信息

• Cured film-forming composition
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US10669376B2

  公开（公告）日：2020-06-02

  Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, R1 denotes hydrogen or a methyl group, and R2 denotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R2.)

  提供的是一种治愈的成膜组合物，由该组合物形成的图像形成底层膜表现出高液体排斥性（亲疏性），即使暴露于低量紫外辐射下，底层膜的亲疏性和液体排斥性也可以轻松改变；以及使用该组合物获得的治愈膜。该治愈成膜树脂组合物的特点是包含：作为组分（A）的具有来自第一单体的结构单元的聚合物，该单体的结构式为（1）；除组分（A）外的另一种聚合物，其相对于聚合物总重量的含氟量低于组分（A），作为组分（B）；作为组分（C）的光酸发生剂；和溶剂。（在公式中，R1表示氢或甲基基团，R2表示能够与R2键合的氧原子一起脱落的含氟基团。）
• CROSSLINKED POLYMER ELECTROLYTE AND METHOD FOR PRODUCING SAME
  申请人：Sumitomo Chemical Company, Limited

  公开号：EP1873789A1

  公开（公告）日：2008-01-02

  There are provided a new crosslinked polymer electrolyte excellent in water resistance and solvent resistance, high in heat resistance, inexpensive and low in methanol permeability, and suitable for the proton conductive membrane of a fuel cell, by means of the crosslinked polymer electrolyte obtained by the following (1) or (2), and its production method. (1) A compound having two or three or more reactive groups is reacted with a polymer electrolyte. (2) A compound having two or three or more reactive groups is reacted with a polymer to obtain a crosslinked polymer and then an ion exchange group is introduced into the resultant polymer.

  本发明提供了一种新型交联聚合物电解质，该电解质具有优异的耐水性和耐溶剂性，耐热性高，价格低廉，甲醇渗透性低，适用于燃料电池的质子传导膜，其交联聚合物电解质的制备方法如下(1)或(2)。 (1) 具有两个或三个或更多活性基团的化合物与聚合物电解质反应。 (2) 将具有两个或三个或更多活性基团的化合物与聚合物反应，得到交联聚合物，然后将离子交换基团引入生成的聚合物中。
• PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM
  申请人：Aoki Yousuke

  公开号：US20120021190A1

  公开（公告）日：2012-01-26

  The photosensitive resin composition of the invention comprises component (a): a first siloxane resin obtained by hydrolytic condensation of a first silane compound comprising a compound represented by the following formula (1), component (b): a solvent in which component (a) dissolves, and component (c): an ester of a phenol or alcohol and naphthoquinone diazide sulfonic acid.
• CURED FILM-FORMING COMPOSITION
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20190085130A1

  公开（公告）日：2019-03-21

  Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, R 1 denotes hydrogen or a methyl group, and R 2 denotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R 2 .)
• US8211558B2
  申请人：——

  公开号：US8211558B2

  公开（公告）日：2012-07-03