申请人:Hitachi Chemical Co., Ltd.
公开号:EP0189271A2
公开(公告)日:1986-07-30
A photosensitive composition comprising an azide compound represented by the formula:
wherein each of X and Y is an aromatic substituent group, at least one of X and Y being an aromatic substituent group having an azide group, and n and m are zeros or integers of 1, and a polymeric compound. Since this composition has high resolution and is photosensitive to light having a wavelength of 436 nm, it permits employment of a reduction projection printer and is suitable for fabrication of semiconductor devices.
一种光敏组合物,包含由式表示的叠氮化物化合物:其中 X 和 Y 均为芳香族取代基,X 和 Y 中至少有一个为具有叠氮基的芳香族取代基,n 和 m 为零或 1 的整数,以及一种聚合物。 由于该组合物具有高分辨率,且对波长为 436 纳米的光具有光敏性,因此可用于还原投影打印机,并适用于半导体器件的制造。