(3,5-Dioxo-4-azatricyclo[5.2.1.02,6]decan-8-yl) 2,2-dimethylbutanoate

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异吲哚及其衍生物
• 英文名称: (3,5-Dioxo-4-azatricyclo[5.2.1.02,6]decan-8-yl) 2,2-dimethylbutanoate
• 英文别名: (3,5-dioxo-4-azatricyclo[5.2.1.02,6]decan-8-yl) 2,2-dimethylbutanoate
• 化学式: C₁₅H₂₁NO₄
• 分子量: 279.33
• InChiKey: FSVVKWRNCMOAFB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  20
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  72.5
• 氢给体数：
  1
• 氢受体数：
  4

文献信息

• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20140141360A1

  公开（公告）日：2014-05-22

  A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit represented by the following formula (I) or (II) as defined in the specification in an amount of 20 mol % or more based on all repeating units in the resin (P) and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, so as to form an exposed film; and (iii) a step of developing the exposed film by using a developer containing an organic solvent to form a negative pattern.
• US9423689B2
  申请人：——

  公开号：US9423689B2

  公开（公告）日：2016-08-23