4,5,6-Trimethyl-pyrogallol | 3997-16-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 4,5,6-Trimethyl-pyrogallol
• 英文别名: Trimethyl-pyrogallol；4,5,6-Trimethylbenzene-1,2,3-triol
• CAS: 3997-16-8
• 化学式: C₉H₁₂O₃
• 分子量: 168.192
• InChiKey: RBLPVXMAVRBHLI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  3-甲氧基-1,2-苯醌 、 4,5,6-Trimethyl-pyrogallol 以 水 、 丙酮 为溶剂， 生成 1',2'-Dihydroxy-3'-methoxy-3,4,5-trimethyl-benzotropolon
  参考文献：
  名称：

  Horner,L. et al., Chemische Berichte, 1964, vol. 97, p. 312 - 324

  摘要：

  DOI：
• 作为产物：
  描述：

  4,5-Dimethyl-pyrogallol 在 盐酸 、 汞 、 锌 作用下， 生成 4,5,6-Trimethyl-pyrogallol
  参考文献：
  名称：

  Horner,L. et al., Chemische Berichte, 1964, vol. 97, p. 312 - 324

  摘要：

  DOI：

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Positive resist composition and photosensitizers
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0769485A1

  公开（公告）日：1997-04-23

  A positive photoresist composition comprising, as a photosensitizer, a quinonediazide sulfonic acid ester of a phenol compound represented by the following formula (I): wherein Q1, Q2, Q3, Q4, Q5, Q6, Q7, Q8, Q9 and Q10 independently represent hydrogen, alkyl having 1-6 carbon atoms or phenyl, or Q1 and Q2, Q3 and Q4, Q5 and Q6, Q7 and Q8, or Q9 and Q10 may form a cycloalkane ring having 6 or less carbon atoms together with a carbon atoms to which they are connected, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15 and R16 independently represent hydrogen, hydroxyl, alkyl having 1-6 carbon atoms or phenyl; and m and n independently represent a number of 0 or 1; and an alkali soluble resin; and a quinonediazide sulfonic acid ester of a phenol compound of formula (I).

  一种正性光刻胶组合物，其光敏剂包括下式(I)代表的苯酚化合物的醌噻磺酸酯： 其中 Q1、Q2、Q3、Q4、Q5、Q6、Q7、Q8、Q9 和 Q10 独立地代表氢、具有 1-6 个碳原子的烷基或苯基，或 Q1 和 Q2、Q3 和 Q4、Q5 和 Q6、Q7 和 Q8、R1、R2、R3、R4、R5、R6、R7、R8、R9、R10、R11、R12、R13、R14、R15 和 R16 独立地代表氢、羟基、具有 1-6 个碳原子的烷基或苯基；m 和 n 独立地代表 0 或 1； 一种碱溶性树脂； 和式 (I) 苯酚化合物的醌噻嗪化磺酸酯。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。
• RESIN COMPOSITION
  申请人：Zeon Corporation

  公开号：EP3345971A1

  公开（公告）日：2018-07-11

  A resin composition comprising a binder resin (A), an aromatic compound (B) represented by the following general formula (1), and a cross-linking agent (C): where in the general formula (1), each of R1 to R8 respectively independently is hydrogen atom, hydroxyl group, carboxyl group, substituted or unsubstituted aliphatic hydrocarbon group having 1 to 12 carbon atoms, or substituted or unsubstituted aromatic hydrocarbon group having 6 to 12 carbon atoms, "m" is an integer of 0 to 2, when "m" is 0, at least two of R1 to R4, R6, and R7 are hydroxyl group, when "m" is 1 or 2, at least two of R1 to R8 are hydroxyl group, and, when "m" is 2 or more, regardless of the structure represented by general formula (1), three or more benzene rings present may be joined with each other at any positions.

  一种树脂组合物，由粘合剂树脂 (A)、由以下通式 (1) 表示的芳香族化合物 (B) 和交联剂 (C) 组成： 其中，在通式（1）中，R1 至 R8 分别独立地为氢原子、羟基、羧基、具有 1 至 12 个碳原子的取代或未取代的脂肪族烃基或具有 6 至 12 个碳原子的取代或未取代的芳香族烃基，"m "为 0 至 2 的整数、当 "m "为 0 时，R1 至 R4、R6 和 R7 中至少有两个是羟基；当 "m "为 1 或 2 时，R1 至 R8 中至少有两个是羟基；当 "m "为 2 或更多时，无论通式（1）所代表的结构如何，存在的三个或更多苯环可在任何位置相互连接。
• Musso,H. et al., Chemische Berichte, 1962, vol. 95, p. 2837 - 2843
  作者：Musso,H. et al.

  DOI：——

  日期：——