2-[4-(7,19-Dihydroxy-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaen-2-yl)phenyl]-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaene-7,19-diol

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并吡喃
• 英文名称: 2-[4-(7,19-Dihydroxy-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaen-2-yl)phenyl]-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaene-7,19-diol
• 化学式: C₄₈H₃₀O₆
• 分子量: 702.763
• InChiKey: FDGRNUZEIPQFLI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  11.69
• 重原子数：
  54.0
• 可旋转键数：
  2.0
• 环数：
  11.0
• sp3杂化的碳原子比例：
  0.04
• 拓扑面积：
  99.38
• 氢给体数：
  4.0
• 氢受体数：
  6.0

反应信息

• 作为产物：
  描述：

  2,6-萘二酚 、 对苯二甲醛 在 硫酸 作用下， 以 丁酮 为溶剂， 反应 6.0h， 以0.1 g的产率得到2-[4-(7,19-Dihydroxy-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaen-2-yl)phenyl]-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaene-7,19-diol
  参考文献：
  名称：

  RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM

  摘要：

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。

  公开号：

  US20160145231A1

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Echigo Masatoshi

  公开号：US20140248561A1

  公开（公告）日：2014-09-04

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
• MATERIAL FOR FORMING UNDERLAYER FILM LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD
  申请人：Echigo Masatoshi

  公开号：US20150090691A1

  公开（公告）日：2015-04-02

  Material for forming an underlayer film for lithography, which has a high carbon concentration, a low oxygen concentration, a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process is disclosed. Material for forming an underlayer film for lithography contains a compound represented by general formula (1).
• US9316913B2
  申请人：——

  公开号：US9316913B2

  公开（公告）日：2016-04-19
• US9540339B2
  申请人：——

  公开号：US9540339B2

  公开（公告）日：2017-01-10
• US9598392B2
  申请人：——

  公开号：US9598392B2

  公开（公告）日：2017-03-21