6-二偶氮-5,6-二氢-5-氧代萘-1-磺酸叔丁酯 | 94202-17-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 中文名称: 6-二偶氮-5,6-二氢-5-氧代萘-1-磺酸叔丁酯
• 中文别名: 2-甲基-5-(1-甲基乙基)-4-{2-[(3-苯基丙基)氨基]乙氧基}苯酚盐酸
• 英文名称: tert-butyl (6E)-6-diazo-5-oxonaphthalene-1-sulfonate
• CAS: 94202-17-2
• 化学式: C14H14N2O4S
• 分子量: 306.34
• InChiKey: WKDVTRCQGQPBNB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  21
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  103
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• Wet developable bottom antireflective coating composition and method for use thereof
  申请人：Chen J. Kuang-Jung

  公开号：US20070243484A1

  公开（公告）日：2007-10-18

  The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
• WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF
  申请人：Chen Kuang-Jung J.

  公开号：US20090291392A1

  公开（公告）日：2009-11-26

  The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
• US7364833B2
  申请人：——

  公开号：US7364833B2

  公开（公告）日：2008-04-29
• US7563563B2
  申请人：——

  公开号：US7563563B2

  公开（公告）日：2009-07-21
• US8202678B2
  申请人：——

  公开号：US8202678B2

  公开（公告）日：2012-06-19