ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
申请人:Takahashi Hidenori
公开号:US20120156618A1
公开(公告)日:2012-06-21
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)
Daasbjerg, Kim; Hansen, John N.; Lund, Henning, Acta Chemica Scandinavica, 1990, vol. 44, # 7, p. 711 - 714
作者:Daasbjerg, Kim、Hansen, John N.、Lund, Henning
DOI:——
日期:——
COMPOUNDS, COMPOSITIONS AND METHODS
申请人:Denali Therapeutics Inc.
公开号:US20210292311A1
公开(公告)日:2021-09-23
The present disclosure relates generally to eukaryotic initiation factor 2B modulators, or a pharmaceutically acceptable salt, stereoisomer, mixture of stereoisomers, or prodrug thereof, and methods of making and using thereof.