RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20210311392A1
公开(公告)日:2021-10-07
Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):